Presentation 2013-05-16
The dissolution process of Si into Ge melt and SiGe growth mechanism by X-ray penetration method
Muthusamy OMPRAKASH, Mukannan ARIVANANDHAN, Raman ARUNKUMAR, Hisashi MORII, Toru AOKI, Tadanobu KOYAMA, Yoshimi MOMOSE, Hiroya IKEDA, Hirokazu Tatsuoka, Yasunori OKANO, Tetsuo OZAWA, Yuko INATOMI, Sridharan MOORTHYBABU, Yasuhiro HAYAKAWA,
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Abstract(in English) Si dissolution into Ge melt and crystal growth of SiGe was in-situ observed by X-ray penetration method. The rectangular shaped sandwich sample of Si (seed)/Ge/Si(feed) was used for the experiment. The penetrated X-ray intensities through the sample were recorded by rectangular shaped CdTe detector as a function of time and temperature. The experimental results demonstrate that the dissolution of Si seed was larger compared to Si feed crystal. Dissolution lengths result agreed well with numerical results. From the experimental and numerical dissolution length results. The dissolution process of Si into Ge melt was strongly influenced by gravity induced solutal convection. Moreover, the crystal growth of SiGe was clearly observed from the drastic variation of penetrated X-ray intensity near the growth interface. The growth mechanism for the observed SiGe growth process was discussed based on the penetrated X-ray intensity profile and composition profile measured by EPMA.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Heat and mass transfer / Growth from solutions / Silicon-Germanium alloy / In-situ observation
Paper # ED2013-21,CPM2013-6,SDM2013-28
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Committee CPM
Conference Date 2013/5/9(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) The dissolution process of Si into Ge melt and SiGe growth mechanism by X-ray penetration method
Sub Title (in English)
Keyword(1) Heat and mass transfer
Keyword(2) Growth from solutions
Keyword(3) Silicon-Germanium alloy
Keyword(4) In-situ observation
1st Author's Name Muthusamy OMPRAKASH
1st Author's Affiliation Research Institute of Electronics, Shizuoka University:Graduate School of Science and Technology, Shizuoka University()
2nd Author's Name Mukannan ARIVANANDHAN
2nd Author's Affiliation Research Institute of Electronics, Shizuoka University
3rd Author's Name Raman ARUNKUMAR
3rd Author's Affiliation Research Institute of Electronics, Shizuoka University
4th Author's Name Hisashi MORII
4th Author's Affiliation Research Institute of Electronics, Shizuoka University
5th Author's Name Toru AOKI
5th Author's Affiliation Research Institute of Electronics, Shizuoka University
6th Author's Name Tadanobu KOYAMA
6th Author's Affiliation Research Institute of Electronics, Shizuoka University
7th Author's Name Yoshimi MOMOSE
7th Author's Affiliation Research Institute of Electronics, Shizuoka University
8th Author's Name Hiroya IKEDA
8th Author's Affiliation Research Institute of Electronics, Shizuoka University
9th Author's Name Hirokazu Tatsuoka
9th Author's Affiliation Faculty of Engineering, Shizuoka University
10th Author's Name Yasunori OKANO
10th Author's Affiliation Osaka University
11th Author's Name Tetsuo OZAWA
11th Author's Affiliation Shizuoka Institute of Science and Technology
12th Author's Name Yuko INATOMI
12th Author's Affiliation Japan Aerospace Exploration Agency
13th Author's Name Sridharan MOORTHYBABU
13th Author's Affiliation Crystal Growth Centre, Anna University
14th Author's Name Yasuhiro HAYAKAWA
14th Author's Affiliation Research Institute of Electronics, Shizuoka University
Date 2013-05-16
Paper # ED2013-21,CPM2013-6,SDM2013-28
Volume (vol) vol.113
Number (no) 40
Page pp.pp.-
#Pages 5
Date of Issue