Presentation 2013-05-16
Formation of GaAsN alloys by surface nitridation
Noriyuki URAKAMI, Akihiro WAKAHARA, Hiroto SEKIGUCHI, Hiroshi OKADA,
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Abstract(in English) GaAsN alloys was grown by surface nitridation and applied for the growth of quantum well (QW). Increase of incorporation of N atoms into GaAsN with decrease of As_2 pressure suggests that N atoms incorporations governed by competing the group-V sites with As atoms. Photoluminescence (PL) peak energy was not dependent on the nitridation time of from 5~15 sec and the energy was approximately 1.37 eV. On the other hands, PL peak energy was 1.31 eV for the nitridation time of 20 sec. The PL intensity was decreased by two orders than those of the nitridetion time of 5~15 sec. The reflection high energy electron diffraction (RHEED) pattern showed As-stabilized (2×4) and N-stabilized (3×3) reconstructions for the samples nitrided by 15sec and 20sec, respectively. Stable Ga-N bonds remain after the interruption time for the surface condition of 15 sec nitridation. Formation of N-clustering consisted a number of N-N pairs lead to the decrease of PL intensity due to the increase of nonradiative center for the surface condition of 20 sec nitridation., In the GaAsN/GaP QW, PL peak energy shifted to low-energy side and the intensity increased with increasing the amount of N supply.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaAsN / Dilute nitride / III-V-N / Surface nitridation
Paper # ED2013-20,CPM2013-5,SDM2013-27
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Committee CPM
Conference Date 2013/5/9(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Formation of GaAsN alloys by surface nitridation
Sub Title (in English)
Keyword(1) GaAsN
Keyword(2) Dilute nitride
Keyword(3) III-V-N
Keyword(4) Surface nitridation
1st Author's Name Noriyuki URAKAMI
1st Author's Affiliation Toyohashi University of Technology()
2nd Author's Name Akihiro WAKAHARA
2nd Author's Affiliation Toyohashi University of Technology
3rd Author's Name Hiroto SEKIGUCHI
3rd Author's Affiliation Toyohashi University of Technology
4th Author's Name Hiroshi OKADA
4th Author's Affiliation Electronics-Inspired Interdisciplinary Research Institute
Date 2013-05-16
Paper # ED2013-20,CPM2013-5,SDM2013-27
Volume (vol) vol.113
Number (no) 40
Page pp.pp.-
#Pages 4
Date of Issue