Presentation 2013-05-16
The process of GaN double polarity selective area growth by using carbon mask
Yohei FUJITA, Yasushi TAKANO, Yoku INOUE, Takayuki NAKANO,
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Abstract(in English) For nonlinear optical applications using gallium nitride (GaN), periodic inversion of crystallographic orientation (polarity) is required for quasi-phase matching. We developed a novel procedure for designing polarity patterns in GaN using metal organic vapor phase epitaxy (MOVPE), and we used this to fabricate periodic polarity-inverted GaN films. By using a carbon mask for the formation of the selective area, substrate nitriding and mask removal of the selective area were done in the GaN epitaxial growth process. In this report, double polarity selective area growth (DP-SAG) was realized by optimization of nitriding condition and mask removal condition.
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Keyword(in English) GaN / MOVPE
Paper # ED2013-18,CPM2013-3,SDM2013-25
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Committee CPM
Conference Date 2013/5/9(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) The process of GaN double polarity selective area growth by using carbon mask
Sub Title (in English)
Keyword(1) GaN
Keyword(2) MOVPE
1st Author's Name Yohei FUJITA
1st Author's Affiliation Department of Electrical and Electronic Engineering, Shizuoka University()
2nd Author's Name Yasushi TAKANO
2nd Author's Affiliation Department of Electronics and Materials Science, Shizuoka University
3rd Author's Name Yoku INOUE
3rd Author's Affiliation Department of Electronics and Materials Science, Shizuoka University
4th Author's Name Takayuki NAKANO
4th Author's Affiliation Department of Electronics and Materials Science, Shizuoka University
Date 2013-05-16
Paper # ED2013-18,CPM2013-3,SDM2013-25
Volume (vol) vol.113
Number (no) 40
Page pp.pp.-
#Pages 5
Date of Issue