Presentation 2013-02-27
Al_2O_3/InSb MOSFETs using an ultra thin InSb layer grown directly on a Si substrate
Koichi MAEZAWA, Taihei ITO, Azusa KADODA, Koji NAKAYAMA, Yuichiro YASUI, Masayuki MORI, Eiji MIYAZAKI, Takashi MIZUTANI,
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Abstract(in English) Al_2O_3/InSb/Si MOSFETs were fabricated with a thin InSb channel layer grown directly on Si(111) substrates. The InSb thickness was ranging from 6 to 25 nm. These thicknesses are close to the critical thickness of the InSb on Si, when the InSb layer is grown using special technique called surface reconstruction controlled epitaxy, which reduces the lattice mismatch from 19.3 to 3.3 % by rotating the in-plane InSb axis by 30-degrees with respect to the Si(111) substrate Good FET characteristics were observed for 10-nm InSb channel devices The dependence of the device properties on the InSb channel thickness were investigated. The enhancement of the effective mobility for thin InSb channel devices was demonstrated, which indicates the crystal quality improvement for quasi pseudomorphic channels.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) MOSFET / InSb / Al2O3 / Molecular Beam Epitaxy / lattice mismatch
Paper # ED2012-135,SDM2012-164
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Committee ED
Conference Date 2013/2/20(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Al_2O_3/InSb MOSFETs using an ultra thin InSb layer grown directly on a Si substrate
Sub Title (in English)
Keyword(1) MOSFET
Keyword(2) InSb
Keyword(3) Al2O3
Keyword(4) Molecular Beam Epitaxy
Keyword(5) lattice mismatch
1st Author's Name Koichi MAEZAWA
1st Author's Affiliation Graduate School of Science and Engineering, University of Toyama()
2nd Author's Name Taihei ITO
2nd Author's Affiliation Graduate School of Science and Engineering, University of Toyama
3rd Author's Name Azusa KADODA
3rd Author's Affiliation Graduate School of Science and Engineering, University of Toyama
4th Author's Name Koji NAKAYAMA
4th Author's Affiliation Graduate School of Science and Engineering, University of Toyama
5th Author's Name Yuichiro YASUI
5th Author's Affiliation Graduate School of Science and Engineering, University of Toyama
6th Author's Name Masayuki MORI
6th Author's Affiliation Graduate School of Science and Engineering, University of Toyama
7th Author's Name Eiji MIYAZAKI
7th Author's Affiliation Graduate School of Engineering, Nagoya University
8th Author's Name Takashi MIZUTANI
8th Author's Affiliation Graduate School of Engineering, Nagoya University
Date 2013-02-27
Paper # ED2012-135,SDM2012-164
Volume (vol) vol.112
Number (no) 445
Page pp.pp.-
#Pages 4
Date of Issue