Presentation 2012-12-07
Change of Scattering Mechanisms of Holes in SiC by Electron Irradiation
Kohji Murata, Tatsuya Morine, Hideharu Matsuura, Shinobu Onoda, Takeshi Ohshima,
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Abstract(in English) SiC has advantages of higher resistance to radiation and higher breakdown electric field, compared with Si. Therefore, SiC attracts attention as a next-generation power device. Although the designs for semiconductor device structures require a lot of electrical properties in semiconductors, however, there is little information on SiC, especially related with resistance to radiation. In our laboratory, therefore, the temperature dependences of majority-carrier concentrations and mobilities in SiC have been measured by Hall-effect measurements using the van der Pauw method. As a result, it turns out that the irradiation of high-energy electrons to Al-doped SiC reduces the hole concentration and mobility. In this study, we simulate the temperature dependences of hole mobilities due to several scattering mechanisms, and discuss the hole scattering mechanism which affects the experimentally-obtained hole mobility the most.
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Keyword(in English) 4H-SiC / Electron Irradiation / Mobility / Scattering Mechanisms
Paper # SDM2012-117
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Committee SDM
Conference Date 2012/11/30(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Change of Scattering Mechanisms of Holes in SiC by Electron Irradiation
Sub Title (in English)
Keyword(1) 4H-SiC
Keyword(2) Electron Irradiation
Keyword(3) Mobility
Keyword(4) Scattering Mechanisms
1st Author's Name Kohji Murata
1st Author's Affiliation Osaka Electro-Communication University()
2nd Author's Name Tatsuya Morine
2nd Author's Affiliation Osaka Electro-Communication University
3rd Author's Name Hideharu Matsuura
3rd Author's Affiliation Osaka Electro-Communication University
4th Author's Name Shinobu Onoda
4th Author's Affiliation Japan Atomic Energy Agency
5th Author's Name Takeshi Ohshima
5th Author's Affiliation Japan Atomic Energy Agency
Date 2012-12-07
Paper # SDM2012-117
Volume (vol) vol.112
Number (no) 337
Page pp.pp.-
#Pages 6
Date of Issue