Presentation 2012-11-29
Electrical characteristics of MIS-diodes with Al_2O_3 deposited by ALD on GaN
Yasuhiro IWATA, Toshiharu KUBO, Takashi EGAWA,
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Abstract(in English) We focused Al_2O_3 as an insulator in MIS structures. MIS-diodes were fabricated with Al_2O_3 deposited by ALD on GaN at 200℃, 250℃ and 300℃, and their electrical characteristics were evaluated. H_2O or O_3 or both of them were used as an oxygen precursor. The leakage current was suppressed by Al_2O_3 deposition, and the smallest threshold voltage shift was observed with the Al_2O_3 deposited by O_3 at 300℃ when using H_2O or O_3. Further the oxide charge in Al_2O_3 deposited by both H_2O and O_3 alternately was smaller than that Al_2O_3 deposited by H_2O or O_3.
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Keyword(in English) GaN / MIS-diodes / ALD / insulator / interface
Paper # ED2012-73,CPM2012-130,LQE2012-101
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Committee ED
Conference Date 2012/11/22(1days)
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Language JPN
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Title (in English) Electrical characteristics of MIS-diodes with Al_2O_3 deposited by ALD on GaN
Sub Title (in English)
Keyword(1) GaN
Keyword(2) MIS-diodes
Keyword(3) ALD
Keyword(4) insulator
Keyword(5) interface
1st Author's Name Yasuhiro IWATA
1st Author's Affiliation Research Center for Nano-Device System, Nagoya Institute of Technology()
2nd Author's Name Toshiharu KUBO
2nd Author's Affiliation Research Center for Nano-Device System, Nagoya Institute of Technology
3rd Author's Name Takashi EGAWA
3rd Author's Affiliation Research Center for Nano-Device System, Nagoya Institute of Technology
Date 2012-11-29
Paper # ED2012-73,CPM2012-130,LQE2012-101
Volume (vol) vol.112
Number (no) 327
Page pp.pp.-
#Pages 4
Date of Issue