Presentation 2012-08-23
Current Injecting Operation and Thermal Analysis of GaInAsP/InP Membrane DFB Laser
Kyohei DOI, Takahiko SHINDO, Mitsuaki FUTAMI, Tomohiro Amemiya, Nobuhiko NISHIYAMA, Shigehisa ARAI,
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Abstract(in English) We have proposed a semiconductor membrane distributed feedback (DFB) laser as a light source for on-chip optical interconnection. The membrane laser consisting of low refractive-index cladding layers is expected to operate with ultra-low threshold current due to its strong optical confinement effect. Up to now, we fabricated the device with the core layer thickness of 450 nm and the cavity length of 300 μm Although a threshold current of 11 mA was observed under RT-pulsed condition, a RT-continuous-wave (CW) operation wasn't achieved. Then, we theoretically investigated thermal characteristics of the membrane laser by using simulated temperature distribution. As a result, thermal resistance of the fabricated device was estimated to be 1100 K/W and it was confirmed that the RT-CW operation was very difficult. Next, the thermal characteristics of the membrane laser with the core layer thickness of 150 nm were calculated. Even though the thermal resistance was estimated to be 7000 K/W at a driving current of 1 mA, it was revealed that a RT-CW operation with a light output power required for 10 Gbit/s on-chip optical interconnection can be obtained.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) semiconductor membrane laser / lateral current injection / strong optical confinement / thermal analysis
Paper # R2012-29,EMD2012-35,CPM2012-60,OPE2012-67,LQE2012-33
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Committee LQE
Conference Date 2012/8/16(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Current Injecting Operation and Thermal Analysis of GaInAsP/InP Membrane DFB Laser
Sub Title (in English)
Keyword(1) semiconductor membrane laser
Keyword(2) lateral current injection
Keyword(3) strong optical confinement
Keyword(4) thermal analysis
1st Author's Name Kyohei DOI
1st Author's Affiliation Dept. of Electrical and Electronic Engineering Tokyo Institute of Technology()
2nd Author's Name Takahiko SHINDO
2nd Author's Affiliation Dept. of Electrical and Electronic Engineering Tokyo Institute of Technology
3rd Author's Name Mitsuaki FUTAMI
3rd Author's Affiliation Dept. of Electrical and Electronic Engineering Tokyo Institute of Technology
4th Author's Name Tomohiro Amemiya
4th Author's Affiliation Quantum Nanoelectronics Research Center Tokyo Institute of Technology
5th Author's Name Nobuhiko NISHIYAMA
5th Author's Affiliation Dept. of Electrical and Electronic Engineering Tokyo Institute of Technology
6th Author's Name Shigehisa ARAI
6th Author's Affiliation Dept. of Electrical and Electronic Engineering Tokyo Institute of Technology:Quantum Nanoelectronics Research Center Tokyo Institute of Technology
Date 2012-08-23
Paper # R2012-29,EMD2012-35,CPM2012-60,OPE2012-67,LQE2012-33
Volume (vol) vol.112
Number (no) 184
Page pp.pp.-
#Pages 6
Date of Issue