| Presentation | 2012-08-09 Production of Cr_2O_3 thin films using the DC-RF magnetron sputtering method Takumi Nakamura, Takuji Kuroda, Nobuyuki Iwata, Hiroshi Yamamoto, |
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| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | The magnetoelectric Cr_2O_3 films are deposited on r- and c-cut sapphire substrates at a substrate temperature higher than 580℃. Increasing the r-cut substrate temperature, the depth of the trenches between grains becomes deeper, leading to rough surface. However, the crystallinity is improved due to higher migration energy. The surface of one grain is quite flat in nm-order. In the meantime, the c-oriented films surface is flat regardless of substrate temperature. The value of the surface roughness Ra is approximately one-tenth comparing to that of r-oriented films. The lattice parameter of direction perpendicular to plane is consistent of bulk value. The stress originated from the mismatch between film and substrate is completely released. From the results of the reciprocal space mapping (RSM), the c-oriented films grow with twin, while the r-oriented films grow without twin. In order to reduce the lattice mismatch, we choose LiNbO_3 (LNO) as a substrate, and undertake the annealing process to obtain step-terraces structure of c-cut LNO. The bunching step appeared at 900℃. The single step lattice height (0.23nm) is observed at 800℃, however, the step-line is wavy. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Cr_2O_3 / films / twin / reciprocal space mapping / anneal |
| Paper # | CPM2012-46 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2012/8/1(1days) |
| Place (in Japanese) | (See Japanese page) |
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| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Production of Cr_2O_3 thin films using the DC-RF magnetron sputtering method |
| Sub Title (in English) | |
| Keyword(1) | Cr_2O_3 |
| Keyword(2) | films |
| Keyword(3) | twin |
| Keyword(4) | reciprocal space mapping |
| Keyword(5) | anneal |
| 1st Author's Name | Takumi Nakamura |
| 1st Author's Affiliation | College of Science & Technology, Nihon Univ.() |
| 2nd Author's Name | Takuji Kuroda |
| 2nd Author's Affiliation | College of Science & Technology, Nihon Univ. |
| 3rd Author's Name | Nobuyuki Iwata |
| 3rd Author's Affiliation | College of Science & Technology, Nihon Univ. |
| 4th Author's Name | Hiroshi Yamamoto |
| 4th Author's Affiliation | College of Science & Technology, Nihon Univ. |
| Date | 2012-08-09 |
| Paper # | CPM2012-46 |
| Volume (vol) | vol.112 |
| Number (no) | 175 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |