| Presentation | 2012-08-09 Formation Process of Reactively-sputtered Nano-crystalline ZrN_x Barrier Films Masaru SATO, Mayumi B. TAKEYAMA, Eiji AOYAGI, Atsushi NOYA, |
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| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Thin diffusion barriers of high performance in several nm thicknesses are required as the size of Cu multilevel interconnects is scaled down. We have demonstrated that a reactively sputtered ZrN_x thin barrier in nanocrystalline texture meets this requirement. In this study, we investigate the process and conditions to form nanocrystalline textured ZrN_x thin films by reactive sputtering consulting the structure zone model by Thornton. Considering the surface mobility of incoming ad-molecules and growth process, we find two solutions to form nanocrystalline phase by choosing sputtering conditions of proper nitrogen composition in the sputtering gas, substrate temperature and target voltage. The stability of ZrN_x phase as a non-stoichiometry compound also contributes the wide variation of sputtering conditions examined. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Cu interconnects / Extremely thin barrier / ZrN / Nano-crystalline / Reactive sputtering |
| Paper # | CPM2012-44 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2012/8/1(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Formation Process of Reactively-sputtered Nano-crystalline ZrN_x Barrier Films |
| Sub Title (in English) | |
| Keyword(1) | Cu interconnects |
| Keyword(2) | Extremely thin barrier |
| Keyword(3) | ZrN |
| Keyword(4) | Nano-crystalline |
| Keyword(5) | Reactive sputtering |
| 1st Author's Name | Masaru SATO |
| 1st Author's Affiliation | Faculty of Engineering, Kitami Institute of Technology() |
| 2nd Author's Name | Mayumi B. TAKEYAMA |
| 2nd Author's Affiliation | Faculty of Engineering, Kitami Institute of Technology |
| 3rd Author's Name | Eiji AOYAGI |
| 3rd Author's Affiliation | Institute for Materials Research, Tohoku University |
| 4th Author's Name | Atsushi NOYA |
| 4th Author's Affiliation | Faculty of Engineering, Kitami Institute of Technology |
| Date | 2012-08-09 |
| Paper # | CPM2012-44 |
| Volume (vol) | vol.112 |
| Number (no) | 175 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |