Presentation | 2012-07-26 Effects of annealing on DC performance of AlGaN/GaN MIS HEMTs Maiko HATANO, Yuya TANIGUCHI, Hirokuni TOKUDA, Masaaki KUZUHARA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We present DC characteristics of AlGaN/GaN MIS HEMTs and discuss the effects of post annealing on the DC performance. The threshold voltage exhibited a negative shift for HEMTs annealed at 500℃ before gate metal deposition. On the other hand, the device annealed after gate metal deposition exhibited a positive shift in threshold voltage and a decrease in leakage current. These results suggest that metal/Al_2O_3 interface barrier height was increased by annealing after gate metal deposition. Without affecting the value of R_ |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | AlGaN/GaN / HEMT / annealing effect |
Paper # | ED2012-41 |
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Committee | ED |
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Conference Date | 2012/7/19(1days) |
Place (in Japanese) | (See Japanese page) |
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Registration To | Electron Devices (ED) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Effects of annealing on DC performance of AlGaN/GaN MIS HEMTs |
Sub Title (in English) | |
Keyword(1) | AlGaN/GaN |
Keyword(2) | HEMT |
Keyword(3) | annealing effect |
1st Author's Name | Maiko HATANO |
1st Author's Affiliation | Graduate School of Engineering, University of Fukui() |
2nd Author's Name | Yuya TANIGUCHI |
2nd Author's Affiliation | Graduate School of Engineering, University of Fukui |
3rd Author's Name | Hirokuni TOKUDA |
3rd Author's Affiliation | Graduate School of Engineering, University of Fukui |
4th Author's Name | Masaaki KUZUHARA |
4th Author's Affiliation | Graduate School of Engineering, University of Fukui |
Date | 2012-07-26 |
Paper # | ED2012-41 |
Volume (vol) | vol.112 |
Number (no) | 154 |
Page | pp.pp.- |
#Pages | 4 |
Date of Issue |