Presentation 2012-05-17
Electrical properties of n- and p-type AlGaPN for dislocation-free light-emitting devices on Si substrate
Hironari ITO, Keisuke KUMAGAI, Hiroto SEKIGUCHI, Hiroshi OKADA, Akihiro WAKAHARA,
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Abstract(in English) AlGaPN alloys are expected as a cladding layer for Si based monolithic laser structure in optoelectronic integrated circuit. Electrical properties of AlGaPN alloys grown by solid source molecular beam epitaxy have been investigated by Hall effect measurement. In n-type AlGaPN, the decrease of electron concentration with increasing N composition is improved as compared with n-type GaPN. In p-type AlGaPN, the alloy scattering is dominant near the room temperature, and activation energy of the acceptor is the same level in p-type GaPN.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) OEIC / III-V-N alloy / AlGaPN / doping
Paper # ED2012-19,CPM2012-3,SDM2012-21
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Committee CPM
Conference Date 2012/5/10(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Electrical properties of n- and p-type AlGaPN for dislocation-free light-emitting devices on Si substrate
Sub Title (in English)
Keyword(1) OEIC
Keyword(2) III-V-N alloy
Keyword(3) AlGaPN
Keyword(4) doping
1st Author's Name Hironari ITO
1st Author's Affiliation Toyohashi University of Technology()
2nd Author's Name Keisuke KUMAGAI
2nd Author's Affiliation Toyohashi University of Technology
3rd Author's Name Hiroto SEKIGUCHI
3rd Author's Affiliation Toyohashi University of Technology
4th Author's Name Hiroshi OKADA
4th Author's Affiliation Toyohashi University of Technology, EIIRIS:Toyohashi University of Technology
5th Author's Name Akihiro WAKAHARA
5th Author's Affiliation Toyohashi University of Technology
Date 2012-05-17
Paper # ED2012-19,CPM2012-3,SDM2012-21
Volume (vol) vol.112
Number (no) 33
Page pp.pp.-
#Pages 4
Date of Issue