Presentation 2012-02-08
Charge distribution near interface of high-k gate insulator in CNFETs
Kosuke SUZUKI, Yutaka OHNO, Shigeru KISHIMOTO, Takashi MIZUTANI,
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Abstract(in English) We have investigated the interface charges generated at the interfaces of the gate insulator in carbon nanotube field-effect transistors (CNFETs) by Kelvin probe force microscopy. It has been found that positive charges are concentrated near the interfaces of the gate insulator with Au electrodes and with a SiO_2 substrate. We have also studied the effect of the positive interface charges on the property of CNFETs, using the device simulation. It has been revealed that the charges at the interface of the gate insulator with the Au electrodes is responsible for the change in the polarity of conduction carriers of CNFETs.
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Keyword(in English) carbon nanotube / ALD / high-k / gate insulator / interface
Paper # ED2011-156,SDM2011-173
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Committee SDM
Conference Date 2012/1/31(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Charge distribution near interface of high-k gate insulator in CNFETs
Sub Title (in English)
Keyword(1) carbon nanotube
Keyword(2) ALD
Keyword(3) high-k
Keyword(4) gate insulator
Keyword(5) interface
1st Author's Name Kosuke SUZUKI
1st Author's Affiliation Department of Quantum Engineering, Nagoya University()
2nd Author's Name Yutaka OHNO
2nd Author's Affiliation Department of Quantum Engineering, Nagoya University
3rd Author's Name Shigeru KISHIMOTO
3rd Author's Affiliation Department of Quantum Engineering, Nagoya University:Venture Business Laboratory, Nagoya University
4th Author's Name Takashi MIZUTANI
4th Author's Affiliation Department of Quantum Engineering, Nagoya University
Date 2012-02-08
Paper # ED2011-156,SDM2011-173
Volume (vol) vol.111
Number (no) 426
Page pp.pp.-
#Pages 5
Date of Issue