Presentation 2012-02-08
Seebeck Coefficient of Ultrathin Si with Fermi Energy Controlled by External Bias
Faiz SALLEH, Kazutoshi MIWA, Hiroya IKEDA,
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Abstract(in English) We varied the Seebeck coefficient of an n-type silicon-on-insulator(SOI) sample by applying an external bias in order to control the Fermi energy of the SOI layer without the formation of imputiy band. The Seebeck coefficient became increasingly negative with increasing positive external bias. This result qualitatively agrees with the characteristic of P-doped SOI layers because the positive bias reduces the Fermi energy of the SOI at the SOI/buried-oxide interface and reduces the electron concentration. Consequently, the Fermi energy can be controlled by controlling the external bias, which modifies the Seebeck coefficient of the SOI sample.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Seebeck coefficient / nanostructure / impurity-band formation / Fermi energy
Paper # ED2011-153,SDM2011-170
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Committee SDM
Conference Date 2012/1/31(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Seebeck Coefficient of Ultrathin Si with Fermi Energy Controlled by External Bias
Sub Title (in English)
Keyword(1) Seebeck coefficient
Keyword(2) nanostructure
Keyword(3) impurity-band formation
Keyword(4) Fermi energy
1st Author's Name Faiz SALLEH
1st Author's Affiliation Research Institute of Electronics, Shizuoka University:Japan Society for the Promotion of Science()
2nd Author's Name Kazutoshi MIWA
2nd Author's Affiliation Research Institute of Electronics, Shizuoka University
3rd Author's Name Hiroya IKEDA
3rd Author's Affiliation Research Institute of Electronics, Shizuoka University
Date 2012-02-08
Paper # ED2011-153,SDM2011-170
Volume (vol) vol.111
Number (no) 426
Page pp.pp.-
#Pages 5
Date of Issue