Presentation 2011-12-16
GaInAsP/Si Hybrid Laser with AlInAs Oxidation Current Confinement Layer by Surface Activated Bonding
Ryo OSABE, Keita FUKUDA, Yusuke HAYASHI, Nobuhiko NISHIYAMA, Shigehisa ARAI,
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Abstract(in English) To introduce an optical gain into photonic integrated circuits on a Si platform, it is very attractive to utilize hybrid integration of III-V compound semiconductors. In this paper, we report on the bonding properties of a 500-nm-thick GaInAsP membrane structure bonded to Si, by the Surface Activated Bonding technology, and structural design of the hybrid laser with an AlInAs oxidation current confinement layer for highly efficient current injection. The full width at half maximum of the photoluminescence (PL) of the GalnAsP membrane structure on the Si waveguide was 38.2 meV, which is comparable to that of conventional OWs, and the PL peak intensity distribution was within the range of 90± 10%. We also calculated the proper oxide width of the AlInAs oxidation type hybrid laser and tried to demonstrate the oxidation process with the bonded wafer.
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Keyword(in English) Surface Activated Bonding / Hybrid laser / oxidation current blocking / silicon photonics
Paper # LQE2011-133
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Committee LQE
Conference Date 2011/12/9(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) GaInAsP/Si Hybrid Laser with AlInAs Oxidation Current Confinement Layer by Surface Activated Bonding
Sub Title (in English)
Keyword(1) Surface Activated Bonding
Keyword(2) Hybrid laser
Keyword(3) oxidation current blocking
Keyword(4) silicon photonics
1st Author's Name Ryo OSABE
1st Author's Affiliation Dept. of Electrical and Electronic Engineering, Tokyo Institute of Technology()
2nd Author's Name Keita FUKUDA
2nd Author's Affiliation Dept. of Electrical and Electronic Engineering, Tokyo Institute of Technology
3rd Author's Name Yusuke HAYASHI
3rd Author's Affiliation Dept. of Electrical and Electronic Engineering, Tokyo Institute of Technology
4th Author's Name Nobuhiko NISHIYAMA
4th Author's Affiliation Dept. of Electrical and Electronic Engineering, Tokyo Institute of Technology
5th Author's Name Shigehisa ARAI
5th Author's Affiliation Dept. of Electrical and Electronic Engineering, Tokyo Institute of Technology:Quantum Nanoelectronics Research Center Tokyo Institute of Technology
Date 2011-12-16
Paper # LQE2011-133
Volume (vol) vol.111
Number (no) 359
Page pp.pp.-
#Pages 6
Date of Issue