Presentation 2011-12-16
High-Temperature (220℃) CW Operation of 1300-nm-range Quantum Dot Laser
Takeo KAGEYAMA, Kenichi NISHI, Masaomi YAMAGUCHI, Reio MOCHIDA, Yasunari MAEDA, Keizo TAKEMASA, Yu TANAKA, Tsuyoshi YAMAMOTO, Mitsuru SUGAWARA, Yasuhiko ARAKAWA,
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Abstract(in English) High temperature lasing operation of semiconductor lasers is important to realize sensing and data transmission at harsh environments like space or deep underground. In addition, the combination of a high temperature-resistant long-wavelength laser and an optical fiber is attractive to expand the field of application such as source exploration. Temperature dependence of the threshold current of a semiconductor laser can be drastically reduced by employing quantum-dot (QD) active layers, and recently QD lasers are applied to the light source such as telecom applications. Here we realized extremely high temperature up to 220℃ continuous-wave (CW) operation of long-wavelength lasers by employing high-density, highly uniform InAs/GaAs quantum dot technology.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) quantum dot / MBE / high-temperature / long-wavelength / semiconductor laser diode
Paper # LQE2011-126
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Conference Information
Committee LQE
Conference Date 2011/12/9(1days)
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Paper Information
Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) High-Temperature (220℃) CW Operation of 1300-nm-range Quantum Dot Laser
Sub Title (in English)
Keyword(1) quantum dot
Keyword(2) MBE
Keyword(3) high-temperature
Keyword(4) long-wavelength
Keyword(5) semiconductor laser diode
1st Author's Name Takeo KAGEYAMA
1st Author's Affiliation QD Laser, Inc.()
2nd Author's Name Kenichi NISHI
2nd Author's Affiliation QD Laser, Inc.:Institute for Nano Quantum Information Electronics, The University of Tokyo
3rd Author's Name Masaomi YAMAGUCHI
3rd Author's Affiliation Fujitsu Laboratories Ltd.
4th Author's Name Reio MOCHIDA
4th Author's Affiliation QD Laser, Inc.:Institute for Nano Quantum Information Electronics, The University of Tokyo
5th Author's Name Yasunari MAEDA
5th Author's Affiliation QD Laser, Inc.
6th Author's Name Keizo TAKEMASA
6th Author's Affiliation QD Laser, Inc.
7th Author's Name Yu TANAKA
7th Author's Affiliation Fujitsu Laboratories Ltd.
8th Author's Name Tsuyoshi YAMAMOTO
8th Author's Affiliation QD Laser, Inc.:Fujitsu Laboratories Ltd.:Institute for Nano Quantum Information Electronics, The University of Tokyo
9th Author's Name Mitsuru SUGAWARA
9th Author's Affiliation QD Laser, Inc.:Institute for Nano Quantum Information Electronics, The University of Tokyo
10th Author's Name Yasuhiko ARAKAWA
10th Author's Affiliation Institute of Industrial Science, The University of Tokyo
Date 2011-12-16
Paper # LQE2011-126
Volume (vol) vol.111
Number (no) 359
Page pp.pp.-
#Pages 4
Date of Issue