Presentation 2011-11-17
Characterization of insulators and interfaces in GaN-based MIS-diodes
Yasuhiro IWATA, Toshiharu KUBO, Takashi EGAWA,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) Al_2O_3 was focused as an insulator in GaN-based MIS structures. We fabricated MIS diodes using AlO_x as the insulator deposited by ALD and evaluated the characteristics. H_2O and O_3 were used as oxygen precursor, and post-deposition annealing was made at 400 ℃, 20 min. As for the composition x and the bandgap E_g, XPS analysis revealed that, x=2.0, and E_g was 6.5~6.8 eV in all conditions. Larger suppression of gate leak current and interface state density was obtained by using O_3 instead of H_2O.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / MIS / Diode / ALD / insulator / interface
Paper # ED2011-80,CPM2011-129,LQE2011-103
Date of Issue

Conference Information
Committee CPM
Conference Date 2011/11/10(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Characterization of insulators and interfaces in GaN-based MIS-diodes
Sub Title (in English)
Keyword(1) GaN
Keyword(2) MIS
Keyword(3) Diode
Keyword(4) ALD
Keyword(5) insulator
Keyword(6) interface
1st Author's Name Yasuhiro IWATA
1st Author's Affiliation Research Center for Nano-Device System, Nagoya Institute of Technology()
2nd Author's Name Toshiharu KUBO
2nd Author's Affiliation Research Center for Nano-Device System, Nagoya Institute of Technology
3rd Author's Name Takashi EGAWA
3rd Author's Affiliation Research Center for Nano-Device System, Nagoya Institute of Technology
Date 2011-11-17
Paper # ED2011-80,CPM2011-129,LQE2011-103
Volume (vol) vol.111
Number (no) 291
Page pp.pp.-
#Pages 4
Date of Issue