Presentation 2011-11-17
Control of interlayer on MOVPE growth of AlN on sapphire substrate
Reina MIYAGAWA, Shibo YANG, Hideto MIYAKE, Kazumasa HIRAMATSU, Takaaki KUWAHARA, Masatoshi MITSUHARA, Noriyuki KUWANO,
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Abstract(in English) The strong demands for high-efficiency light-emitting diodes and for high-sensitivity sensors in the deep-ultraviolet (UV) region has led to renewed interest in the growth of high-quality AlN. We have studied growth of high-quality AlN with a nucleation layer method. The growth conditions of a medium-temperature (MT-) AlN nucleation layer were examined the interface of the AlN and sapphire substrate. AlN layer with a highly crystalline quality of small tilting and twisting was obtained when the growth temperature of MT-AlN was 1250℃; however, the surface of AlN was rough because of the mixture of crystallographic polarity. On the other hand, for an AlN layer on the MT-AlN grown at 1100℃, both the tilt and surface morphology improved, although a future challenge is to reduce twist, but the was not much reduced. For further high-crystalline AlN growth, effects of the carrier gas ratio and growth temperature are examined with the aim of optimizing the growth conditions of high-temperature (HT-) AlN. As a result, with increasing ratio of N_2 in the carrier gas, the radius of curvature of the AlN layer increased and the compressive strain decreased. The reduction of compressive strain and increase in curvature of the AlN layer were due to an increase in the number of dislocations.
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Keyword(in English) AlN / MOVPE / sapphire / interlayer
Paper # ED2011-74,CPM2011-123,LQE2011-97
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Committee CPM
Conference Date 2011/11/10(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Control of interlayer on MOVPE growth of AlN on sapphire substrate
Sub Title (in English)
Keyword(1) AlN
Keyword(2) MOVPE
Keyword(3) sapphire
Keyword(4) interlayer
1st Author's Name Reina MIYAGAWA
1st Author's Affiliation Department, Mie University()
2nd Author's Name Shibo YANG
2nd Author's Affiliation Department, Mie University
3rd Author's Name Hideto MIYAKE
3rd Author's Affiliation Department, Mie University
4th Author's Name Kazumasa HIRAMATSU
4th Author's Affiliation Department, Mie University
5th Author's Name Takaaki KUWAHARA
5th Author's Affiliation Department of Applied Science for Electronics and Materials, Kyushu University
6th Author's Name Masatoshi MITSUHARA
6th Author's Affiliation Department of Applied Science for Electronics and Materials, Kyushu University
7th Author's Name Noriyuki KUWANO
7th Author's Affiliation Art, Science and Technology Center for Cooperative Research, Kyushu University
Date 2011-11-17
Paper # ED2011-74,CPM2011-123,LQE2011-97
Volume (vol) vol.111
Number (no) 291
Page pp.pp.-
#Pages 6
Date of Issue