Presentation 2011-10-21
High Purity Metal Organic Gas Distribution System
Satoru YAMASHITA, Hidekazu ISHII, Yoshinobu SHIBA, Masafumi KITANO, Yasuyuki SHIRAI, Shigetoshi SUGAWA, Tadahiro OHMI,
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Abstract(in English) The gas flow control is important factor that influenced to the concentration of process gas and the pressure of process chamber. In composite semiconductor manufacturing process that using metal organic (MO) gases, the flow control system that controls the flow rate of MO gas must be established to improve the film performance and reliability of film formation process. So, flow control system based on pressure measurement (FCS) for high temperature was developed and it is possible to control the flow rate of MO gases. Also, the concentration of MO gas was controlled with great accuracy. Furthermore, liquid source control system (LSCS) was developed for the purpose of reduction of MO gas distribution system area and thermal history. And the system that MO material only the quantity needed was vaporized and control the flow rate of MO gas was developed.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) metal organic gas / MOCVD / flow control system
Paper # SDM2011-112
Date of Issue

Conference Information
Committee SDM
Conference Date 2011/10/13(1days)
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Paper Information
Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) High Purity Metal Organic Gas Distribution System
Sub Title (in English)
Keyword(1) metal organic gas
Keyword(2) MOCVD
Keyword(3) flow control system
1st Author's Name Satoru YAMASHITA
1st Author's Affiliation New Industry Creation Hatchery Center, Tohoku University()
2nd Author's Name Hidekazu ISHII
2nd Author's Affiliation New Industry Creation Hatchery Center, Tohoku University
3rd Author's Name Yoshinobu SHIBA
3rd Author's Affiliation New Industry Creation Hatchery Center, Tohoku University
4th Author's Name Masafumi KITANO
4th Author's Affiliation New Industry Creation Hatchery Center, Tohoku University
5th Author's Name Yasuyuki SHIRAI
5th Author's Affiliation New Industry Creation Hatchery Center, Tohoku University
6th Author's Name Shigetoshi SUGAWA
6th Author's Affiliation New Industry Creation Hatchery Center, Tohoku University:Graduate School of Engineering, Tohoku University
7th Author's Name Tadahiro OHMI
7th Author's Affiliation New Industry Creation Hatchery Center, Tohoku University
Date 2011-10-21
Paper # SDM2011-112
Volume (vol) vol.111
Number (no) 249
Page pp.pp.-
#Pages 6
Date of Issue