Presentation 2011-10-12
Improvement in Electrical Characteristics of NbN tunnel Junctions With Plasma-Nitrided AlNx Barriers
Tatsunori FUNAI, Naoto NAITO, Hiroyuki AKAIKE, Akira FUJIMAKI,
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Abstract(in English) We present the fabrication process of NbN tunnel junctions with plasma-nitrided AlNx barriers and the electrical characteristics of the junctions. The application of the junctions to high frequency electromagnetic wave detectors requires increase in the critical current density J_c and the gap voltage V_g of the junctions. In this work, we examined the conditions of depositing a counter NbN layer and forming an AINx barrier for the purpose of improving the characteristics of the junctions. As a result, the V_g was increased by 0.4 mV to 5.0 mV by adjusting the deposition conditions and by raising the substrate temperature during deposition of the counter NbN layer. On the other hand, the J_c up to 10.2 kA/cm^2 was obtained by changing the RF power density for nitriding an Al layer.
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Keyword(in English) Plasma-Nitridation / AlNx / NbN
Paper # SCE2011-15
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Committee SCE
Conference Date 2011/10/5(1days)
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Registration To Superconductive Electronics (SCE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Improvement in Electrical Characteristics of NbN tunnel Junctions With Plasma-Nitrided AlNx Barriers
Sub Title (in English)
Keyword(1) Plasma-Nitridation
Keyword(2) AlNx
Keyword(3) NbN
1st Author's Name Tatsunori FUNAI
1st Author's Affiliation Department of Quamtum Engineering, Nagoya University()
2nd Author's Name Naoto NAITO
2nd Author's Affiliation Department of Quamtum Engineering, Nagoya University
3rd Author's Name Hiroyuki AKAIKE
3rd Author's Affiliation Department of Quamtum Engineering, Nagoya University
4th Author's Name Akira FUJIMAKI
4th Author's Affiliation Department of Quamtum Engineering, Nagoya University
Date 2011-10-12
Paper # SCE2011-15
Volume (vol) vol.111
Number (no) 230
Page pp.pp.-
#Pages 6
Date of Issue