Presentation 2011-08-25
1.3 μm InAs/GaAs Quantum Dot Lasers on Si Substrates by Direct Semiconductor Bonding
Katsuaki TANABE, Katsuyuki WATANABE, Yasuhiko ARAKAWA,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) III-V semiconductor compound light sources monolithically integrated on Si substrates or waveguides would be promising for the realization of photonic integrated circuits. Specifically quantum dot lasers yield low lasing threshold current and high temperature stability and therefore are suitable for high-density integration. In this work, we have developed low-resistivity GaAs/Si direct wafer bonding technique and successfully fabricated 1.3 μm InAs/GaAs quantum dot lasers on Si substrates. Our conductive direct-bonded heterostructures enables both electrical injection and optical coupling, and therefore gives more flexibility in design and operation of photonic integrated circuits in contrast to conventional SiO_2- and metal-mediated bonding. Our fabricated laser device has achieved a lasing threshold current density of 205 A/cm^2, the lowest of any kind of semiconductor laser on Si.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Quantum Dots / Semiconductor Lasers / Silicon Photonics / Wafer Bonding
Paper # EMD2011-42,CPM2011-86,OPE2011-77,LQE2011-40
Date of Issue

Conference Information
Committee CPM
Conference Date 2011/8/18(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) 1.3 μm InAs/GaAs Quantum Dot Lasers on Si Substrates by Direct Semiconductor Bonding
Sub Title (in English)
Keyword(1) Quantum Dots
Keyword(2) Semiconductor Lasers
Keyword(3) Silicon Photonics
Keyword(4) Wafer Bonding
1st Author's Name Katsuaki TANABE
1st Author's Affiliation Institute for Nano Quantum Information Electronics, University of Tokyo()
2nd Author's Name Katsuyuki WATANABE
2nd Author's Affiliation Institute for Nano Quantum Information Electronics, University of Tokyo
3rd Author's Name Yasuhiko ARAKAWA
3rd Author's Affiliation Institute for Nano Quantum Information Electronics, University of Tokyo:Institute of Industrial Science, University of Tokyo
Date 2011-08-25
Paper # EMD2011-42,CPM2011-86,OPE2011-77,LQE2011-40
Volume (vol) vol.111
Number (no) 184
Page pp.pp.-
#Pages 6
Date of Issue