| Presentation | 2011-08-10 Hydrogen effects on the properties of Si- and N-coincorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition Saori OKUNO, Soshi MIURA, Ryosuke KAMATA, Hideki NAKAZAWA, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | To further improve the properties of diamond-like carbon (DLC) films, we have deposited Si- and N-coincorporated DLC (Si-N-DLC) films by radio-frequency plasma-enhanced chemical vapor deposition using hexamethyldisilazane (HMDS) as a Si and N source, and investigated in detail the effects of dilution gas on the film properties. CH_4 and HMDS were used to deposit Si-N-DLC films, and they were diluted with Ar or H_2 during deposition. A DC bias applied to the substrate was used to increase the incident ion energy. The internal stress and friction coefficient decreased and the adhesion strength increased with increasing HMDS flow ratio [HMDS/(HMDS+CH_4)]. It was found that H2 dilution was effective in suppressing the formation of particles and further decreasing the friction coefficient and increasing the adhesion strength and wear resistance. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Diamond-like carbon / Plasma-enhanced chemical vapor deposition / Silicon / Nitrogen |
| Paper # | CPM2011-62 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2011/8/3(1days) |
| Place (in Japanese) | (See Japanese page) |
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| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Hydrogen effects on the properties of Si- and N-coincorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition |
| Sub Title (in English) | |
| Keyword(1) | Diamond-like carbon |
| Keyword(2) | Plasma-enhanced chemical vapor deposition |
| Keyword(3) | Silicon |
| Keyword(4) | Nitrogen |
| 1st Author's Name | Saori OKUNO |
| 1st Author's Affiliation | Faculty of Science and Technology, Hirosaki University() |
| 2nd Author's Name | Soshi MIURA |
| 2nd Author's Affiliation | Faculty of Science and Technology, Hirosaki University |
| 3rd Author's Name | Ryosuke KAMATA |
| 3rd Author's Affiliation | Faculty of Science and Technology, Hirosaki University |
| 4th Author's Name | Hideki NAKAZAWA |
| 4th Author's Affiliation | Faculty of Science and Technology, Hirosaki University |
| Date | 2011-08-10 |
| Paper # | CPM2011-62 |
| Volume (vol) | vol.111 |
| Number (no) | 176 |
| Page | pp.pp.- |
| #Pages | 6 |
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