Presentation 2011-05-20
Stabilized Pt deposition on the TiO_2 films and their photocatalytic properties
Ikuta NAKAMURA, Takanori SATO, Masaaki ISAI, Yoichi HOSHI,
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Abstract(in English) TiO_2 films were prepared with RF magnetron sputtering method. The platinum (Pt) films were deposited on the TiO_2 films. The effect of Pt films on the photocatalytic properties were evaluated. It was found that depositing Pt as a cocatalyst improves organic-decomposition properties, but deteriorated hydrophilicity because Pt films have hydrophobic property. The Pt-deposition rate was successfully controlled by using a metallic mesh installing in the ion-coater. It could improved organic-decomposition properties without deteriorating of hydrophilicity. We confirmed that the Pt-deposition quantity was one of the most important parameters to improve the organic-decomposition properties.
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Keyword(in English) TiO_2 thin films / RF magnetron sputtering / Photocatalyst / Pratinum deposition
Paper # ED2011-28,CPM2011-35,SDM2011-41
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Committee CPM
Conference Date 2011/5/12(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Stabilized Pt deposition on the TiO_2 films and their photocatalytic properties
Sub Title (in English)
Keyword(1) TiO_2 thin films
Keyword(2) RF magnetron sputtering
Keyword(3) Photocatalyst
Keyword(4) Pratinum deposition
1st Author's Name Ikuta NAKAMURA
1st Author's Affiliation Graduate School of Engineering, Shizuoka University()
2nd Author's Name Takanori SATO
2nd Author's Affiliation Facility of Engineering, Shizuoka University
3rd Author's Name Masaaki ISAI
3rd Author's Affiliation Facility of Engineering, Shizuoka University
4th Author's Name Yoichi HOSHI
4th Author's Affiliation Graduate School of Engineering, Tokyo Polytechnic University
Date 2011-05-20
Paper # ED2011-28,CPM2011-35,SDM2011-41
Volume (vol) vol.111
Number (no) 45
Page pp.pp.-
#Pages 5
Date of Issue