Presentation	2011-04-22 Photosensitivity in Extremely High Index Contrast Silica-based Waveguides on Si Makoto ABE, Masayuki ITOH, Toshimi KOMINATO, Yusuke NASU, Mikitaka ITOH,
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Abstract(in English)	We demonstrate the photosensitivity of an extremely high index contrast Ta_2O_5-doped silica and SiON waveguide using an arrayed-waveguide grating multi/demultiplexer. We investigated the UV induced refractive index change and insertion loss increase. We also investigated their thermal relaxation.
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Keyword(in English)	silica / waveguide / lightwave circuit / PLC / UV / index change / photosensitivity / AWG
Paper #	R2011-7,CPM2011-7,OPE2011-7
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Conference Information
Committee	OPE
Conference Date	2011/4/15(1days)
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Paper Information
Registration To	Optoelectronics (OPE)
Language	JPN
Title (in Japanese)	(See Japanese page)
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Title (in English)	Photosensitivity in Extremely High Index Contrast Silica-based Waveguides on Si
Sub Title (in English)
Keyword(1)	silica
Keyword(2)	waveguide
Keyword(3)	lightwave circuit
Keyword(4)	PLC
Keyword(5)	UV
Keyword(6)	index change
Keyword(7)	photosensitivity
Keyword(8)	AWG
1st Author's Name	Makoto ABE
1st Author's Affiliation	NTT Photonics Labs. NTT Corp.()
2nd Author's Name	Masayuki ITOH
2nd Author's Affiliation	NTT Photonics Labs. NTT Corp.
3rd Author's Name	Toshimi KOMINATO
3rd Author's Affiliation	NTT Photonics Labs. NTT Corp.
4th Author's Name	Yusuke NASU
4th Author's Affiliation	NTT Photonics Labs. NTT Corp.
5th Author's Name	Mikitaka ITOH
5th Author's Affiliation	NTT Photonics Labs. NTT Corp.
Date	2011-04-22
Paper #	R2011-7,CPM2011-7,OPE2011-7
Volume (vol)	vol.111
Number (no)	16
Page	pp.pp.-
#Pages	5
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