| Presentation | 2011-02-07 Dependence of Ti-Based Self-Formed Barrier Structure on Dielectric-Layer Composition Kazuyuki KOHAMA, Kazuhiro ITO, Yutaka SONOBAYASHI, Kazuyuki OHMORI, Kenichi MORI, Kazuyoshi MAEKAWA, Yasuharu SHIRAI, Masanori MURAKAMI, |
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| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Ti-based self-formed barrier layer using Cu(Ti) alloy seed applied to 45 nm-node dual-damascene interconnects was reported to have sufficient barrier strength to prevent Cu diffusion into dielectrics. However, the barrier structure such as a volume fraction and a position of the constituent Ti compounds were unknown. Thus, barrier mechanism of the self-formed Ti-based barrier layers was indistinct. In the present study, we employed an X-ray Photoelectron Spectroscopy (XPS) technique with simultaneous Ar etching, to investigate systematically the barrier structure of the Ti-based barrier layers self-formed on several dielectrics. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | LSI / Cu interconnect / Cu(Ti) / RBS / XPS |
| Paper # | SDM2010-221 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2011/1/31(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Dependence of Ti-Based Self-Formed Barrier Structure on Dielectric-Layer Composition |
| Sub Title (in English) | |
| Keyword(1) | LSI |
| Keyword(2) | Cu interconnect |
| Keyword(3) | Cu(Ti) |
| Keyword(4) | RBS |
| Keyword(5) | XPS |
| 1st Author's Name | Kazuyuki KOHAMA |
| 1st Author's Affiliation | Dept. of Materials Science and Engineering, Kyoto Univ.() |
| 2nd Author's Name | Kazuhiro ITO |
| 2nd Author's Affiliation | Dept. of Materials Science and Engineering, Kyoto Univ. |
| 3rd Author's Name | Yutaka SONOBAYASHI |
| 3rd Author's Affiliation | Dept. of Materials Science and Engineering, Kyoto Univ. |
| 4th Author's Name | Kazuyuki OHMORI |
| 4th Author's Affiliation | Renesas Electronics Corporation |
| 5th Author's Name | Kenichi MORI |
| 5th Author's Affiliation | Renesas Electronics Corporation |
| 6th Author's Name | Kazuyoshi MAEKAWA |
| 6th Author's Affiliation | The Ritsumeikan Trust |
| 7th Author's Name | Yasuharu SHIRAI |
| 7th Author's Affiliation | Dept. of Materials Science and Engineering, Kyoto Univ. / |
| 8th Author's Name | Masanori MURAKAMI |
| 8th Author's Affiliation | |
| Date | 2011-02-07 |
| Paper # | SDM2010-221 |
| Volume (vol) | vol.110 |
| Number (no) | 408 |
| Page | pp.pp.- |
| #Pages | 5 |
| Date of Issue | |