| Presentation | 2011-02-07 Networked nanographite growth using photoemission-assisted enhanced plasma CVD : discharge condition dependence of the crystallographic quality Shuichi OGAWA, Motonobu SATO, Haruki SUMI, Mizuhisa NIHEI, Yuji TAKAKUWA, |
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| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | The photoemission-assisted plasma chemical vapor deposition has been developed to form the graphene for large area without any catalysts in low temperature. In this study, we have investigated the plasma voltage dependence of the crystallographic quality of networked nanographite (NNG). The width of Raman spectra, which indicates the crystallographic quality of the graphitic materials, grown by photoemission-assisted plasma is narrower than that by traditional DC discharge plasma. Furthermore, it is found that the G band width of NNG grown at 200 V of plasma voltage is narrower than that of carbon nanowall grown by the microwave plasma CVD. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Photoemission-assisted plasma / Nanographite / Multilayer graphene / plasma-enhanced chemical vapor deposition / Raman spectroscopy |
| Paper # | SDM2010-220 |
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| Conference Information | |
| Committee | SDM |
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| Conference Date | 2011/1/31(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Silicon Device and Materials (SDM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Networked nanographite growth using photoemission-assisted enhanced plasma CVD : discharge condition dependence of the crystallographic quality |
| Sub Title (in English) | |
| Keyword(1) | Photoemission-assisted plasma |
| Keyword(2) | Nanographite |
| Keyword(3) | Multilayer graphene |
| Keyword(4) | plasma-enhanced chemical vapor deposition |
| Keyword(5) | Raman spectroscopy |
| 1st Author's Name | Shuichi OGAWA |
| 1st Author's Affiliation | IMRAM, Tohoku University:CREST, JST() |
| 2nd Author's Name | Motonobu SATO |
| 2nd Author's Affiliation | CREST, JST:Fujitsu Limited |
| 3rd Author's Name | Haruki SUMI |
| 3rd Author's Affiliation | IMRAM, Tohoku University |
| 4th Author's Name | Mizuhisa NIHEI |
| 4th Author's Affiliation | CREST, JST:Fujitsu Limited |
| 5th Author's Name | Yuji TAKAKUWA |
| 5th Author's Affiliation | IMRAM, Tohoku University:CREST, JST |
| Date | 2011-02-07 |
| Paper # | SDM2010-220 |
| Volume (vol) | vol.110 |
| Number (no) | 408 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |