Presentation 2010-12-17
Lasing in GaAs_<1-x>Bi_x/GaAs thin film cavity by photo-pumping and its low-temperature-dependent oscillation wavelength
Yoriko TOMINAGA, Kunishige OE, Masahiro YOSHIMOTO,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Lasing oscillation from a GaAs_<1-x>Bi_x/GaAs thin film with a Fabry-Perot cavity is achieved by photo-pumping. The GaAS_<0.975>Bi_<0.025> active layer was grown at as low as 350℃ by molecular beam epitaxy. The characteristic temperature of the laser was 83 K between 160 and 240 K. In this temperature range, temperature coefficient of the lasing emission peak energy was -0.18 meV/K, which is 40% of the value for the band gap of GaAs. Above 240 K, the lasing threshold pumping power increased sharply, and the lasing emission peak energy started shifting to a higher energy.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Bismide III-V semiconductor-semimetal alloy / Molecular beam epitaxy / Fabry-Perot laser
Paper # LQE2010-124
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Committee LQE
Conference Date 2010/12/10(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Lasing in GaAs_<1-x>Bi_x/GaAs thin film cavity by photo-pumping and its low-temperature-dependent oscillation wavelength
Sub Title (in English)
Keyword(1) Bismide III-V semiconductor-semimetal alloy
Keyword(2) Molecular beam epitaxy
Keyword(3) Fabry-Perot laser
1st Author's Name Yoriko TOMINAGA
1st Author's Affiliation Department of Electronics, Kyoto Institute of Technology()
2nd Author's Name Kunishige OE
2nd Author's Affiliation Department of Electronics, Kyoto Institute of Technology
3rd Author's Name Masahiro YOSHIMOTO
3rd Author's Affiliation Department of Electronics, Kyoto Institute of Technology
Date 2010-12-17
Paper # LQE2010-124
Volume (vol) vol.110
Number (no) 353
Page pp.pp.-
#Pages 4
Date of Issue