Presentation 2010-12-16
Enhancing the Resolution of Millimeter-Wave Microscopy Using a Metal Slit-Type Probe
Noriyuki MIYASAKA, Tatsuo NOZOKIDO,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) A novel type of slit probe incorporating a micromachined silicon (Si) chip for millimeter-wave scanning near-field microscopy is proposed. In order to improve the spatial resolution and image contrast attainable in millimeter-wave microscopy, a metal-coated Si chip with a micro-slit aperture fabricated using a bulk micromachining technique was attached to the tip of an ordinary slit-type probe at the end of a tapered rectangular waveguide. The design and fabrication of the Si chip are described and the results from experiments performed at U-band (40-60 GHz) frequencies to demonstrate the feasibility of this new probe configuration are presented.
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Keyword(in English) Bulk micromachining / millimeter-wave imaging / near-field probes / scanning near-field microscopy
Paper # MW2010-127
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Committee MW
Conference Date 2010/12/9(1days)
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Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Enhancing the Resolution of Millimeter-Wave Microscopy Using a Metal Slit-Type Probe
Sub Title (in English)
Keyword(1) Bulk micromachining
Keyword(2) millimeter-wave imaging
Keyword(3) near-field probes
Keyword(4) scanning near-field microscopy
1st Author's Name Noriyuki MIYASAKA
1st Author's Affiliation Graduate School of Science and Engineering for Research, University of Toyama()
2nd Author's Name Tatsuo NOZOKIDO
2nd Author's Affiliation Graduate School of Science and Engineering for Research, University of Toyama
Date 2010-12-16
Paper # MW2010-127
Volume (vol) vol.110
Number (no) 343
Page pp.pp.-
#Pages 6
Date of Issue