| Presentation | 2010-11-11 ELO-AlN on trench-patterned AlN/sapphire by low-pressure HVPE Kohei FUJITA, Hideto MIYAKE, Kazumasa HIRAMATSU, Jyun NORIMATSU, Hideki HIRAYAMA, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We have fabricated crack-free thick AlN films with low threading dislocation density (TDD) on trench-patterned AlN/Sapphire substrates for application to deep-ultraviolet (DUV) light-emitting diodes (LEDs) by low-pressure hydride vapor phase epitaxy (LP-HVPE). We systematically investigated mechanism of void structure formed by the epitaxial lateral overgrowth (ELO) process. It was found that the height of void-tops was proportional to the groove width and the growth rate ratio of vertical to lateral. And, the height of void-bottoms was proportional to the parameter defined as the square of groove-width devided by the groove-depth. Furthermore, the growth rate ratio of vertical to lateral increased with increasing growth temperature or increasing V/III ratio. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | HVPE / AlN / ELO / crack-free |
| Paper # | ED2010-147,CPM2010-113,LQE2010-103 |
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| Conference Information | |
| Committee | LQE |
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| Conference Date | 2010/11/4(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Paper Information | |
| Registration To | Lasers and Quantum Electronics (LQE) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | ELO-AlN on trench-patterned AlN/sapphire by low-pressure HVPE |
| Sub Title (in English) | |
| Keyword(1) | HVPE |
| Keyword(2) | AlN |
| Keyword(3) | ELO |
| Keyword(4) | crack-free |
| 1st Author's Name | Kohei FUJITA |
| 1st Author's Affiliation | Faculty of Engineering, Mie University() |
| 2nd Author's Name | Hideto MIYAKE |
| 2nd Author's Affiliation | Faculty of Engineering, Mie University |
| 3rd Author's Name | Kazumasa HIRAMATSU |
| 3rd Author's Affiliation | Faculty of Engineering, Mie University |
| 4th Author's Name | Jyun NORIMATSU |
| 4th Author's Affiliation | RIKEN |
| 5th Author's Name | Hideki HIRAYAMA |
| 5th Author's Affiliation | RIKEN |
| Date | 2010-11-11 |
| Paper # | ED2010-147,CPM2010-113,LQE2010-103 |
| Volume (vol) | vol.110 |
| Number (no) | 273 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |