Presentation 2010-11-30
A wafer-level system integration technology for heterogeneous devices with pseudo-SoC
Hiroshi YAMADA, Yutaka ONO〓KA, Atsuko IIDA, Kazuhiko ITAYA, Hideyuki FUNAKI,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) A wafer level system integration technology for heterogeneous devices has been developed by applying pseudo-SOC. The pseudo-SOC is designed to realize a single microchip with heterogeneous devices using individual processes, for epoxy resin, insulating layer, and redistribution layer, respectively. The KGD (Known Good Die) heterogeneous devices are embedded in the epoxy resin to reconfigure the reconfigured integration wafer. As the insulating layer and redistribution layer are formed by semiconductor wafer process without interposer substrate, the pseudo-SOC enables integration density as identical to that of SOC. This paper presents an overview of wafer level system integration technology for heterogeneous devices by applied pseudo-SoC and then focuses on the flexible pseudo-SOC which integrates optical MEMS and its driver CMOS-LSI for mobile electronics device applications.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Pseudo-SoC / Heterogeneous device / Wafer-level / System integration / Flexible
Paper # CPM2010-135,ICD2010-94
Date of Issue

Conference Information
Committee CPM
Conference Date 2010/11/22(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) A wafer-level system integration technology for heterogeneous devices with pseudo-SoC
Sub Title (in English)
Keyword(1) Pseudo-SoC
Keyword(2) Heterogeneous device
Keyword(3) Wafer-level
Keyword(4) System integration
Keyword(5) Flexible
1st Author's Name Hiroshi YAMADA
1st Author's Affiliation Corporate R&D Center, Toshiba Corporation()
2nd Author's Name Yutaka ONO〓KA
2nd Author's Affiliation Corporate R&D Center, Toshiba Corporation
3rd Author's Name Atsuko IIDA
3rd Author's Affiliation Corporate R&D Center, Toshiba Corporation
4th Author's Name Kazuhiko ITAYA
4th Author's Affiliation Corporate R&D Center, Toshiba Corporation
5th Author's Name Hideyuki FUNAKI
5th Author's Affiliation Corporate R&D Center, Toshiba Corporation
Date 2010-11-30
Paper # CPM2010-135,ICD2010-94
Volume (vol) vol.110
Number (no) 314
Page pp.pp.-
#Pages 6
Date of Issue