| Presentation | 2010-11-12 Study of etching-induced damage in p-type GaN by hard X-ray photoelectron spectroscopy Daigo KIKUTA, Tetsuo NARITA, Naoko TAKAHASHI, Keita KATAOKA, Yasuji KIMOTO, Tsutomu UESUGI, Tetsu KACHI, Masahiro SUGIMOTO, |
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| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | We carried out nondestructive measurements of the depth profile of etching-induced damage in p-GaN, in particular surface band bending, using Hard X-ray Photoelectron Spectroscopy (HAX-PES). HAX-PES at different take-off angles of photoelectrons made it clear that etching by inductively-coupled plasma (ICP) introduced donor-like states in a surface layer of GaN. We were able to quantitatively analyze band bending and charge distribution in an etched p-GaN. The analysis results indicated the existence of deep donors with a concentration of 1-2×10^<20> cm^<-3> in a surface layer whose thickness increased with increasing a bias power of ICP. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | GaN / Hard X-ray Photoelectron Spectroscopy (HAX-PES) / dry etching / etching-induced damage / inductively-coupled plasma |
| Paper # | ED2010-155,CPM2010-121,LQE2010-111 |
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| Conference Information | |
| Committee | CPM |
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| Conference Date | 2010/11/4(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Component Parts and Materials (CPM) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Study of etching-induced damage in p-type GaN by hard X-ray photoelectron spectroscopy |
| Sub Title (in English) | |
| Keyword(1) | GaN |
| Keyword(2) | Hard X-ray Photoelectron Spectroscopy (HAX-PES) |
| Keyword(3) | dry etching |
| Keyword(4) | etching-induced damage |
| Keyword(5) | inductively-coupled plasma |
| 1st Author's Name | Daigo KIKUTA |
| 1st Author's Affiliation | Toyota Central R&D Labs., Inc.() |
| 2nd Author's Name | Tetsuo NARITA |
| 2nd Author's Affiliation | Toyota Central R&D Labs., Inc. |
| 3rd Author's Name | Naoko TAKAHASHI |
| 3rd Author's Affiliation | Toyota Central R&D Labs., Inc. |
| 4th Author's Name | Keita KATAOKA |
| 4th Author's Affiliation | Toyota Central R&D Labs., Inc. |
| 5th Author's Name | Yasuji KIMOTO |
| 5th Author's Affiliation | Toyota Central R&D Labs., Inc. |
| 6th Author's Name | Tsutomu UESUGI |
| 6th Author's Affiliation | Toyota Central R&D Labs., Inc. |
| 7th Author's Name | Tetsu KACHI |
| 7th Author's Affiliation | Toyota Central R&D Labs., Inc. |
| 8th Author's Name | Masahiro SUGIMOTO |
| 8th Author's Affiliation | Toyota Motor Corporation |
| Date | 2010-11-12 |
| Paper # | ED2010-155,CPM2010-121,LQE2010-111 |
| Volume (vol) | vol.110 |
| Number (no) | 272 |
| Page | pp.pp.- |
| #Pages | 4 |
| Date of Issue | |