Presentation 2010-11-11
Growth characteristics of GaNP layer and InAs-based QDs on Si substrate
Satoru Tanabe, Rei Nishio, Yoshitaka Kobayashi, Kosuke Nemoto, Tomoyuki Miyamoto,
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Abstract(in English) In this report, we investigate the basic property of the GaNP layer and the InAs-based quantum dots grown on Si substrate. In the GaNP layer growth on the Si substrate, two step growth method and strain GaInP buffer layer was introduced to suppress the 3D growth and decrease the surface roughness. Moreover, we investigated the the growth temperature dependency, the InAs supply dependency, and the nitrogen composition in the GaNP buffer layer dependency to clarify the InAs formation characteristic.
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Keyword(in English) Si / GaNP / InAs / Quantum dots / MOCVD
Paper # ED2010-145,CPM2010-111,LQE2010-101
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Committee CPM
Conference Date 2010/11/4(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Growth characteristics of GaNP layer and InAs-based QDs on Si substrate
Sub Title (in English)
Keyword(1) Si
Keyword(2) GaNP
Keyword(3) InAs
Keyword(4) Quantum dots
Keyword(5) MOCVD
1st Author's Name Satoru Tanabe
1st Author's Affiliation Tokyo Institute of Technology()
2nd Author's Name Rei Nishio
2nd Author's Affiliation Tokyo Institute of Technology
3rd Author's Name Yoshitaka Kobayashi
3rd Author's Affiliation Tokyo Institute of Technology
4th Author's Name Kosuke Nemoto
4th Author's Affiliation Tokyo Institute of Technology
5th Author's Name Tomoyuki Miyamoto
5th Author's Affiliation Tokyo Institute of Technology
Date 2010-11-11
Paper # ED2010-145,CPM2010-111,LQE2010-101
Volume (vol) vol.110
Number (no) 272
Page pp.pp.-
#Pages 5
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