Presentation 2010-11-11
Study on improved crystal quality of non-polar A-plane InN grown on r-plane sapphire by RF-MBE
Tsutomu ARAKI, Keisuke KAWASHIMA, Tomohiro YAMAGUCHI, Yasushi NANISHI,
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Abstract(in English) In this paper, we will report on the effects of nitridation and a low-temperature InN buffer layer on the growth of A-plane InN, and demonstrate successful improvements in crystal quality as well as surface morphology and electrical properties. A-plane InN films were grown on a nitridated r-plane sapphire by RF-MBE. The (11-20) XRC FWHM and surface morphology of the InN layers grown with 250℃-nitridation was improved with the decrease in the growth temperature of the buffer layer. We also confirmed that the semi-polar InN inclusion in the InN buffer layer was well suppressed by decreasing the nitridation temperature down to RT. The A-plane InN grown with the optimized InN buffer layer and substrate nitridation showed the improved XRC FWHM (33.1 arcmin.), flat surface morphology (rms 2.6 nm) and relatively low carrier concentration (4.7×10^<18>/cm^3) compared to the conventional A-plane InN without the LT-InN buffer.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) InN / non-polar / crystal growth / MBE / nitridation / buffer layer
Paper # ED2010-143,CPM2010-109,LQE2010-99
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Conference Information
Committee CPM
Conference Date 2010/11/4(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Study on improved crystal quality of non-polar A-plane InN grown on r-plane sapphire by RF-MBE
Sub Title (in English)
Keyword(1) InN
Keyword(2) non-polar
Keyword(3) crystal growth
Keyword(4) MBE
Keyword(5) nitridation
Keyword(6) buffer layer
1st Author's Name Tsutomu ARAKI
1st Author's Affiliation Dept. of Photonics, Ritsumeikan University()
2nd Author's Name Keisuke KAWASHIMA
2nd Author's Affiliation Dept. of Photonics, Ritsumeikan University
3rd Author's Name Tomohiro YAMAGUCHI
3rd Author's Affiliation R-GIRO, Ritsumeikan University
4th Author's Name Yasushi NANISHI
4th Author's Affiliation Dept. of Photonics, Ritsumeikan University:WCU Program, Seoul National University
Date 2010-11-11
Paper # ED2010-143,CPM2010-109,LQE2010-99
Volume (vol) vol.110
Number (no) 272
Page pp.pp.-
#Pages 4
Date of Issue