Presentation 2010-01-28
BaAl_2S_4:Eu EL Devices Prepared by DC-Reactive-Sputtering
Yasuhiro WATANABE, Noboru MIURA, Hironaga MATSUMOTO, Ryotaro NAKANO,
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Abstract(in English) BaAl_2S_4:Eu thin films were prepared by DC reactive sputtering using Ar;H2S mixture gas. It was found that best condition of flow ratio (H2S/total gas) is 2%. The crystallinity and PL characteristics of BaAl_2S_4:Eu thin films show best under the condition of substrate temperature during the sputtering and annealing temperature are 400℃ and 790℃, respectively. EL devices having double insulating structure were fabricated with these conditions. The maximum luminance was 14.4 cd/m2 under the 1 kHz sinusoidal voltage. The maximum luminance level increased with insert the buffer layers between the phosphor layer and both insulating layers.
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Keyword(in English) BaAl_2S_4:Eu / DC reactive sputtering / Electroluminescence
Paper # EID2009-57
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Committee EID
Conference Date 2010/1/21(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) BaAl_2S_4:Eu EL Devices Prepared by DC-Reactive-Sputtering
Sub Title (in English)
Keyword(1) BaAl_2S_4:Eu
Keyword(2) DC reactive sputtering
Keyword(3) Electroluminescence
1st Author's Name Yasuhiro WATANABE
1st Author's Affiliation Department of Electronics & Communications, School of Science & Technology, Meiji University()
2nd Author's Name Noboru MIURA
2nd Author's Affiliation Department of Electronics & Communications, School of Science & Technology, Meiji University
3rd Author's Name Hironaga MATSUMOTO
3rd Author's Affiliation Department of Electronics & Communications, School of Science & Technology, Meiji University
4th Author's Name Ryotaro NAKANO
4th Author's Affiliation Department of Electronics & Communications, School of Science & Technology, Meiji University
Date 2010-01-28
Paper # EID2009-57
Volume (vol) vol.109
Number (no) 404
Page pp.pp.-
#Pages 4
Date of Issue