Presentation 2010-05-13
Improved p-InGaN/AlGaN/GaN normally-off HEMTs on silicon substrates
kazuhiro NAGAI, Lawrence SELVARAJ, Takashi EGAWA,
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Abstract(in English) Normally-off AlGaN/GaN HEMTs with Mg-doped p-InGaN cap layer were grown and HEMT devices were processed at different active annealing temperatures (700℃ to 850℃). For activation annealing at 800℃, a good pinch-off at a device threshold voltage of 1.48 V was obtained with good pinch-off characteristics. A positive shift of 3 V for our devices was confirmed when compared to the already existing AlGaN/GaN HEMTs. Also HEMTs with p-InGaN grown at different growth temperature (700℃ to 1000℃) were studied and a V_ of 1.62 V was observed for p-InGaN grown at 800℃. Further these HEMTs demonstrate a good I_-V_ up to V_G, of+3.5 V.
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Keyword(in English) Si substrate / AlGaN/GaN / HEMT / normally-off
Paper # ED2010-18,CPM2010-8,SDM2010-18
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Committee SDM
Conference Date 2010/5/6(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
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Title (in English) Improved p-InGaN/AlGaN/GaN normally-off HEMTs on silicon substrates
Sub Title (in English)
Keyword(1) Si substrate
Keyword(2) AlGaN/GaN
Keyword(3) HEMT
Keyword(4) normally-off
1st Author's Name kazuhiro NAGAI
1st Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology()
2nd Author's Name Lawrence SELVARAJ
2nd Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
3rd Author's Name Takashi EGAWA
3rd Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
Date 2010-05-13
Paper # ED2010-18,CPM2010-8,SDM2010-18
Volume (vol) vol.110
Number (no) 31
Page pp.pp.-
#Pages 5
Date of Issue