Presentation | 2009-12-04 Si substrate processing by ethanol cluster ion beam technique Hiroshi MUKAI, Hiromichi RYUTO, Mitsuaki TAKEUCHI, Gikan TAKAOKA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Irradiation effect of an ethanol cluster ion beam on a photoresist masked silicon surface was investigated to examine the possibility of the application of an ethanol cluster ion beam. The sputtered depth in silicon induced by the ethanol cluster ion beam was approximately the same as that in photoresist. The test pattern of photoresist mask was successfully reproduced on the silicon substrate irradiated with an ethanol cluster ion beams to a silicon processing. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Cluster ion beam / Surface modification / Sputtering / Ethanol |
Paper # | SDM2009-158 |
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Conference Information | |
Committee | SDM |
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Conference Date | 2009/11/27(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Silicon Device and Materials (SDM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Si substrate processing by ethanol cluster ion beam technique |
Sub Title (in English) | |
Keyword(1) | Cluster ion beam |
Keyword(2) | Surface modification |
Keyword(3) | Sputtering |
Keyword(4) | Ethanol |
1st Author's Name | Hiroshi MUKAI |
1st Author's Affiliation | Photonics and Electronics Science and Engineering Center, Kyoto University() |
2nd Author's Name | Hiromichi RYUTO |
2nd Author's Affiliation | Photonics and Electronics Science and Engineering Center, Kyoto University |
3rd Author's Name | Mitsuaki TAKEUCHI |
3rd Author's Affiliation | Photonics and Electronics Science and Engineering Center, Kyoto University |
4th Author's Name | Gikan TAKAOKA |
4th Author's Affiliation | Photonics and Electronics Science and Engineering Center, Kyoto University |
Date | 2009-12-04 |
Paper # | SDM2009-158 |
Volume (vol) | vol.109 |
Number (no) | 321 |
Page | pp.pp.- |
#Pages | 3 |
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