Presentation 2010/5/6
Measurement of Electron Traps in n-GaN on Si(111) Substrates by Deep-Level Transient Spectroscopy
Arata WATANABE, Takashi EGAWA,
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Abstract(in English) GaN and its alloys have found broad application for the visible to ultraviolet optoelectronics, high frequency, high power, and high temperature electron devices. Over a decade, the growth of these nitrides on Si substrate has become a subject of great interest, because of the numerous advantages like significantly lower cost, good thermal conductivity, and availability in large diameter. However, there are some difficulties in the growth of GaN on Si, especially deep traps of GaN due to lattice mismatch between them. In this paper, we report electron traps in n-GaN grown on Si substrates by MOCVD, and analyzed the crystal quality, electrical properties and investigated the deep traps by DLTS measurement.
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Keyword(in English) Si substrate / GaN / DLTS / deep level / MOCVD
Paper # CPM2010-7,ED2010-17,SDM2010-17
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Committee CPM
Conference Date 2010/5/6(1days)
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Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Measurement of Electron Traps in n-GaN on Si(111) Substrates by Deep-Level Transient Spectroscopy
Sub Title (in English)
Keyword(1) Si substrate
Keyword(2) GaN
Keyword(3) DLTS
Keyword(4) deep level
Keyword(5) MOCVD
1st Author's Name Arata WATANABE
1st Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology()
2nd Author's Name Takashi EGAWA
2nd Author's Affiliation Research Center for Nano-Device and System, Nagoya Institute of Technology
Date 2010/5/6
Paper # CPM2010-7,ED2010-17,SDM2010-17
Volume (vol) vol.110
Number (no) 30
Page pp.pp.-
#Pages 4
Date of Issue