| Presentation | 2010-06-22 70% Read Margin Enhancement by V_ | Mismatch Self-Repair in 6T-SRAM with Asymmetric Pass Gate Transistor by Zero Additional Cost, Post-Process, Local Electron Injection Kousuke MIYAJI, Shuhei TANAKAMARU, Kentaro HONDA, Shinji MIYANO, Ken TAKEUCHI, | |
|---|---|---|---|
| PDF Download Page |  PDF download Page Link |
||
| Abstract(in Japanese) | (See Japanese page) | ||
| Abstract(in English) | A V_ | mismatch self-repair scheme in 6T-SRAM with asymmetric PG transistor by post-process local electron injection is proposed. The asymmetric V_ | shift is doubled from the conventional scheme without process and area penalty. Measurement results show 24% increase in SNM without write degradation by the asymmetric PG transistor. 70% read margin enhancement is achieved by the proposed scheme. |
| Keyword(in Japanese) | (See Japanese page) | ||
| Keyword(in English) | SRAM / V_ | variation / asymmetric pass gate transistor / read margin / self-repair / zero-cost / post-process / local electron injection | |
| Paper # | SDM2010-44 | ||
| Date of Issue |
| Conference Information | |
| Committee | SDM |
|---|---|
| Conference Date | 2010/6/15(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | |
| Vice Chair | |
| Secretary | |
| Assistant | |
| Paper Information | ||
| Registration To | Silicon Device and Materials (SDM) | |
|---|---|---|
| Language | JPN | |
| Title (in Japanese) | (See Japanese page) | |
| Sub Title (in Japanese) | (See Japanese page) | |
| Title (in English) | 70% Read Margin Enhancement by V_ | Mismatch Self-Repair in 6T-SRAM with Asymmetric Pass Gate Transistor by Zero Additional Cost, Post-Process, Local Electron Injection |
| Sub Title (in English) | ||
| Keyword(1) | SRAM | |
| Keyword(2) | V_ | variation |
| Keyword(3) | asymmetric pass gate transistor | |
| Keyword(4) | read margin | |
| Keyword(5) | self-repair | |
| Keyword(6) | zero-cost | |
| Keyword(7) | post-process | |
| Keyword(8) | local electron injection | |
| 1st Author's Name | Kousuke MIYAJI | |
| 1st Author's Affiliation | Institute of Industrial Science, University of Tokyo() | |
| 2nd Author's Name | Shuhei TANAKAMARU | |
| 2nd Author's Affiliation | Faculty of of Engineering, University of Tokyo | |
| 3rd Author's Name | Kentaro HONDA | |
| 3rd Author's Affiliation | Faculty of of Engineering, University of Tokyo | |
| 4th Author's Name | Shinji MIYANO | |
| 4th Author's Affiliation | Semiconductor Technology Academic Research Center (STARC) | |
| 5th Author's Name | Ken TAKEUCHI | |
| 5th Author's Affiliation | Faculty of of Engineering, University of Tokyo | |
| Date | 2010-06-22 | |
| Paper # | SDM2010-44 | |
| Volume (vol) | vol.110 | |
| Number (no) | 90 | |
| Page | pp.pp.- | |
| #Pages | 5 | |
| Date of Issue | ||