Presentation 2010-06-22
Molecular Orbital Analysis of Stability of Ge(100) Surface Terminated by Various Atoms
DongHun LEE, Takeshi KANASHIMA, Masanori OKUYAMA,
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Abstract(in English) Germanium (Ge) is highlighted as a candidate semiconductor of high speed transistor because of its higher carrier mobility than that of Si. However, it is well known that Ge surface is not passivated easily by wet chemical treatment or by hydrogen treatment unlike Si surface. In this study, we have theoretically simulated the chemical reactivity of various atoms with Ge(100) surface for searching adequate ambient treatment by using molecular orbital method. As the result, we have confirmed that Ge surface is more stable by fluorine and boron than hydrogen.
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Keyword(in English) Semi-empirical molecular / Mopac2009 / Ge / Surface treatment / Fluorine treatment
Paper # SDM2010-39
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Committee SDM
Conference Date 2010/6/15(1days)
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Registration To Silicon Device and Materials (SDM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Molecular Orbital Analysis of Stability of Ge(100) Surface Terminated by Various Atoms
Sub Title (in English)
Keyword(1) Semi-empirical molecular
Keyword(2) Mopac2009
Keyword(3) Ge
Keyword(4) Surface treatment
Keyword(5) Fluorine treatment
1st Author's Name DongHun LEE
1st Author's Affiliation Division of Advanced Electronics and Optical Science, Department of Systems Innovation, Graduate School of Engineering Science, Osaka University()
2nd Author's Name Takeshi KANASHIMA
2nd Author's Affiliation Division of Advanced Electronics and Optical Science, Department of Systems Innovation, Graduate School of Engineering Science, Osaka University
3rd Author's Name Masanori OKUYAMA
3rd Author's Affiliation Institution for NanoScience Design, Osaka University
Date 2010-06-22
Paper # SDM2010-39
Volume (vol) vol.110
Number (no) 90
Page pp.pp.-
#Pages 5
Date of Issue