Presentation 2009-11-20
Variation of surface properties of Mg-doped GaN subjected to high-temperature annealing
Eri OGAWA, Tamotsu HASHIUME,
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Abstract(in English) We have investigated chemical, electrical and optical properties of Mg-doped GaN surfaces subjected to a high-temperature anneal. X-ray photoelectron spectroscopy (XPS) showed that Ga2p peaks were clearly detected at the SiO_2/p-GaN surface after the annealing at 1000℃, in addition to the Si and O peaks originating from SiO_2 surface. This indicated that the out-diffusion of Ga atom was induced by high-temperature anneal. After removing the SiO_2 film, we found a significant segregation of Mg atoms near the p-GaN surface with the Mg-doping of 1x10^<19>cm^<-3>. For the as-grown sample with the Mg-doping of 2x10^<19>cm^<-3>, a broad PL peak at around 3.1eV was detected in addition to a weak band-edge emission. After the annealing, a new peak appeared at around 2.8eV, of which the peak position is very close to the so-called blue luminescence (BL) often observed in the highly Mg-doped GaN. On the other hand, different PL spectra were observed for the sample with the Mg-doping of 3x10^<18>cm^<-3> before and after the annealing, indicating that the formation of deep level is dependent on the Mg density and annealing condition.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Mg-doped GaN / Ga vacancy / Mg accumulation / Deep level / XPS / PL
Paper # ED2009-150,CPM2009-124,LQE2009-129
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Conference Information
Committee LQE
Conference Date 2009/11/12(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Variation of surface properties of Mg-doped GaN subjected to high-temperature annealing
Sub Title (in English)
Keyword(1) Mg-doped GaN
Keyword(2) Ga vacancy
Keyword(3) Mg accumulation
Keyword(4) Deep level
Keyword(5) XPS
Keyword(6) PL
1st Author's Name Eri OGAWA
1st Author's Affiliation Graduate School of Information Science and Technology, Hokkaido University:Research Center for Integrated Quantum Electronics, Hokkaido University:CREST-JST()
2nd Author's Name Tamotsu HASHIUME
2nd Author's Affiliation Graduate School of Information Science and Technology, Hokkaido University:Research Center for Integrated Quantum Electronics, Hokkaido University:CREST-JST
Date 2009-11-20
Paper # ED2009-150,CPM2009-124,LQE2009-129
Volume (vol) vol.109
Number (no) 290
Page pp.pp.-
#Pages 4
Date of Issue