Presentation 2009-11-20
Emitter-metal-related degradation in InP-based HBTs and its suppression by introducing refractory metal
Yoshino K. FUKAI, Kenji KURISHIMA, Norihide KASHIO, Minoru IDA, Shoji YAMAHATA, Takatomo ENOKI,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Bias-temperature accelerated tests under high temperatures and high current densities of up to 5mA/μm^2 were conducted for InP HBTs with conventional emitter electrodes of Ti/Pt/Au, and with refractory metal emitters of Ti/Mo-Ti/Pt/Au, Ti/W-Ti/Pt/Au, or W-Ti/Pt/Au. Severe damage and disruption of uniformity of the atomic composition in the emitter contact layer were observed due to diffusion of Ti and Au with conventional emitter, whereas suppression of those degradations with refractory emitter. The increase in emitter resistance has the same activation energy for all types of emitter electrode, which are 2.0 and 1.65eV for J_c of 2 and 5mA/μm^2, respectively. The lifetime was one order larger for HBTs with refractory metal than for HBTs with conventional metal at the same junction temperature. The advantages of refractory metal electrode were confirmed, especially for operation at high current densities.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) InP HBT / emitter metal / refractory metal / emitter resistance
Paper # R2009-43
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Committee R
Conference Date 2009/11/13(1days)
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Registration To Reliability(R)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Emitter-metal-related degradation in InP-based HBTs and its suppression by introducing refractory metal
Sub Title (in English)
Keyword(1) InP HBT
Keyword(2) emitter metal
Keyword(3) refractory metal
Keyword(4) emitter resistance
1st Author's Name Yoshino K. FUKAI
1st Author's Affiliation NTT Photonics Laboratories, NTT Corporation()
2nd Author's Name Kenji KURISHIMA
2nd Author's Affiliation NTT Photonics Laboratories, NTT Corporation
3rd Author's Name Norihide KASHIO
3rd Author's Affiliation NTT Photonics Laboratories, NTT Corporation
4th Author's Name Minoru IDA
4th Author's Affiliation NTT Photonics Laboratories, NTT Corporation
5th Author's Name Shoji YAMAHATA
5th Author's Affiliation NTT Photonics Laboratories, NTT Corporation
6th Author's Name Takatomo ENOKI
6th Author's Affiliation NTT Photonics Laboratories, NTT Corporation
Date 2009-11-20
Paper # R2009-43
Volume (vol) vol.109
Number (no) 294
Page pp.pp.-
#Pages 6
Date of Issue