| Presentation | 2009-11-13 Effect of magnetic dot shape in BPM on magnetic and R/W performance with 1Tbit/in^2 regime Jun ARIAKE, Yuji KONDO, Shunji ISHIO, Naoki HONDA, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Fine magnetic dot arrays with an areal density around 1Tbit/in^2 were fabricated for obtaining fabrication process issues and design parameter of bit patterned media (BPM). In dot size analysis, a size distribution of about 1nm of standard deviation existed. This distribution corresponds to about 5kOe in H_k distribution in BPM from a simulated result. In dot period analysis, a dispersion value of about 5% was found in both a scanning direction of EB exposure and a direction perpendicular to the scanning direction. Dot period dispersion must be reduced because it is proportional to switching field distribution (SFD) from a simulated result. Undulation analysis along an EB scanning direction in fine magnetic dots revealed that magnetostatic interaction can be occurred between dots in cross track direction. A very stable and accurate process is required for BPM fabrication at 1Tbit/in^2 and beyond. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | bit patterned media / fine magnetic dot array / Electron beam lithography / dot shape analysis / switching field distribution |
| Paper # | MR2009-30 |
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| Conference Information | |
| Committee | MR |
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| Conference Date | 2009/11/6(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
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| Paper Information | |
| Registration To | Magnetic Recording (MR) |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Effect of magnetic dot shape in BPM on magnetic and R/W performance with 1Tbit/in^2 regime |
| Sub Title (in English) | |
| Keyword(1) | bit patterned media |
| Keyword(2) | fine magnetic dot array |
| Keyword(3) | Electron beam lithography |
| Keyword(4) | dot shape analysis |
| Keyword(5) | switching field distribution |
| 1st Author's Name | Jun ARIAKE |
| 1st Author's Affiliation | AIT, Akita Prefectural R & D Center() |
| 2nd Author's Name | Yuji KONDO |
| 2nd Author's Affiliation | AIT, Akita Prefectural R & D Center |
| 3rd Author's Name | Shunji ISHIO |
| 3rd Author's Affiliation | Akita University |
| 4th Author's Name | Naoki HONDA |
| 4th Author's Affiliation | Tohoku Institute of technology |
| Date | 2009-11-13 |
| Paper # | MR2009-30 |
| Volume (vol) | vol.109 |
| Number (no) | 282 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |