Presentation 2009-06-24
A New Combination of RSD and Inside Spacer Thin Film Transistor
M. J. Chang, T. C. Li, F. T. Chien, C. N. Liao, Y. T. Tsai,
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Abstract(in English) In this paper, we proposed a combination structure polycrystalline silicon (poly-Si) thin film transistor of raised source/drain (RSD) and inside spacer (IS). From the experiment and simulation of electric field, it shows the lower electric field strength than the conventional one. Therefore it can decrease the kink current and lower leakage current can be achieved. Moreover our proposed structure had almost the same on/off current ratio compared with conventional.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) raised source/drain (RSD) / inside spacer (IS) / high-k material / leakage current / on/off current raito
Paper # ED2009-67,SDM2009-62
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Committee SDM
Conference Date 2009/6/17(1days)
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Registration To Silicon Device and Materials (SDM)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) A New Combination of RSD and Inside Spacer Thin Film Transistor
Sub Title (in English)
Keyword(1) raised source/drain (RSD)
Keyword(2) inside spacer (IS)
Keyword(3) high-k material
Keyword(4) leakage current
Keyword(5) on/off current raito
1st Author's Name M. J. Chang
1st Author's Affiliation Dept. of Electronic Engineering, Feng Chia University()
2nd Author's Name T. C. Li
2nd Author's Affiliation Dept. of Electronic Engineering, Feng Chia University
3rd Author's Name F. T. Chien
3rd Author's Affiliation Dept. of Electronic Engineering, Feng Chia University
4th Author's Name C. N. Liao
4th Author's Affiliation Dept. of Electrical Engineering, National Central University
5th Author's Name Y. T. Tsai
5th Author's Affiliation Dept. of Electrical Engineering, National Central University
Date 2009-06-24
Paper # ED2009-67,SDM2009-62
Volume (vol) vol.109
Number (no) 98
Page pp.pp.-
#Pages 4
Date of Issue