Presentation 2009-06-24
Theoretical study on graphene field-effect transistors
Eiichi SANO, Taiichi OTSUJI,
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Abstract(in English) Graphene is one of the most attractive materials for "beyond CMOS" electronics. We investigate graphene-layer compositions suitable for the channel in graphene field-effect transistors (GFETs) in terms of the energy band structure and charge controllability. We examine three major methods of opening a bandgap in graphene. We then compare the threshold voltage and subthreshold-slope characteristics as measures of short-channel effects for GFETs, where graphene is modeled as a narrow-gap semiconductor based on the band consideration, with those for ultra-thin-body silicon-on-insulator (UTB-SOI) MOSFETs using a drift-diffusion-based simulator. The intrinsic delay times for GFETs are also compared with those for UTB-SOI MOSFETs.
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Keyword(in English) Graphene / Energy band structure / Effective mass / MOSFET / SOI / Delay
Paper # ED2009-62,SDM2009-57
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Committee SDM
Conference Date 2009/6/17(1days)
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Registration To Silicon Device and Materials (SDM)
Language ENG
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Theoretical study on graphene field-effect transistors
Sub Title (in English)
Keyword(1) Graphene
Keyword(2) Energy band structure
Keyword(3) Effective mass
Keyword(4) MOSFET
Keyword(5) SOI
Keyword(6) Delay
1st Author's Name Eiichi SANO
1st Author's Affiliation Research Center for Integrated Quantum Electronics, Hokkaido University:CREST, Japan Science and Technology Agency()
2nd Author's Name Taiichi OTSUJI
2nd Author's Affiliation Research Institute of Electrical Communication, Tohoku University:CREST, Japan Science and Technology Agency
Date 2009-06-24
Paper # ED2009-62,SDM2009-57
Volume (vol) vol.109
Number (no) 98
Page pp.pp.-
#Pages 6
Date of Issue