Presentation 2009-06-19
Theoretical Study on Fabrication Tolerance of Five-Layer Asymmetric Coupled Quantum Well
Yuji ISERI, Taro ARAKAWA, Kunio TADA, Nobuo HANEJI,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) For evaluating fabrication tolerance of an InGaAs/InAlAs five-layer asymmetric coupled quantum well (FACQW), influence of abruptness of heterointerfaces in the FACQW on its electrorefractive effect was theoretically studied. In the analysis, it is assumed that composition profile in a heterointerface is exponential, and a thickness of a transition layer L is defined. We investigated the change in electrorefractive index of the FACQW with various L. With the increase of L, electrorefractive index change remarkably decreases especially in the case of L≥3ML. In addition, we propose an improved FACQW structure which is expected to exhibit large electrorefractive index even in the case of L=3ML.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Quantum Well / Five-Layer Asymmetric Coupled Quantum Well / InGaAs / Heterointerface Abruptness / Electrorefractive effect
Paper # OPE2009-16,LQE2009-19
Date of Issue

Conference Information
Committee LQE
Conference Date 2009/6/12(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Theoretical Study on Fabrication Tolerance of Five-Layer Asymmetric Coupled Quantum Well
Sub Title (in English)
Keyword(1) Quantum Well
Keyword(2) Five-Layer Asymmetric Coupled Quantum Well
Keyword(3) InGaAs
Keyword(4) Heterointerface Abruptness
Keyword(5) Electrorefractive effect
1st Author's Name Yuji ISERI
1st Author's Affiliation Graduate School of Eng., Yokohama National Univ.()
2nd Author's Name Taro ARAKAWA
2nd Author's Affiliation Graduate School of Eng., Yokohama National Univ.
3rd Author's Name Kunio TADA
3rd Author's Affiliation Graduate School of Eng., Kanazawa Institute of Technology
4th Author's Name Nobuo HANEJI
4th Author's Affiliation Graduate School of Eng., Yokohama National Univ.
Date 2009-06-19
Paper # OPE2009-16,LQE2009-19
Volume (vol) vol.109
Number (no) 93
Page pp.pp.-
#Pages 6
Date of Issue