Presentation 2009-06-19
Constriction of Ferromagnetic Patterned Thin Film by Nano Scratching using AFM cantilever
Hidenori SUGANUMA, Kyungmin JANG, Tsutomu YAMADA, Yasushi TAKEMURA,
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Abstract(in English) The purpose of this study is to fabricate nano-contacts on ferromagnetic patterned thin film by nanolithography technique using atomic force microscope (AFM) and to observe attractive current-voltage and magnetoresistance characteristics. Direct scratch lithography was performed on NiFe thin films using AFM cantilever with various parameters of cantilever force, speed and count of scans. The nano-contact of 139nm width and 3.0×10^2nm^2 cross sectional area was successfully fabricated.
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Keyword(in English) Atomic force microscope / ferromagnetic thin film / nanolithography / nano-junction
Paper # EMD2009-15,CPM2009-27,OME2009-22
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Committee CPM
Conference Date 2009/6/12(1days)
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Registration To Component Parts and Materials (CPM)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Constriction of Ferromagnetic Patterned Thin Film by Nano Scratching using AFM cantilever
Sub Title (in English)
Keyword(1) Atomic force microscope
Keyword(2) ferromagnetic thin film
Keyword(3) nanolithography
Keyword(4) nano-junction
1st Author's Name Hidenori SUGANUMA
1st Author's Affiliation Yokohama National University()
2nd Author's Name Kyungmin JANG
2nd Author's Affiliation Yokohama National University
3rd Author's Name Tsutomu YAMADA
3rd Author's Affiliation Yokohama National University
4th Author's Name Yasushi TAKEMURA
4th Author's Affiliation Yokohama National University
Date 2009-06-19
Paper # EMD2009-15,CPM2009-27,OME2009-22
Volume (vol) vol.109
Number (no) 90
Page pp.pp.-
#Pages 4
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