Presentation | 2009-06-19 Constriction of Ferromagnetic Patterned Thin Film by Nano Scratching using AFM cantilever Hidenori SUGANUMA, Kyungmin JANG, Tsutomu YAMADA, Yasushi TAKEMURA, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | The purpose of this study is to fabricate nano-contacts on ferromagnetic patterned thin film by nanolithography technique using atomic force microscope (AFM) and to observe attractive current-voltage and magnetoresistance characteristics. Direct scratch lithography was performed on NiFe thin films using AFM cantilever with various parameters of cantilever force, speed and count of scans. The nano-contact of 139nm width and 3.0×10^2nm^2 cross sectional area was successfully fabricated. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Atomic force microscope / ferromagnetic thin film / nanolithography / nano-junction |
Paper # | EMD2009-15,CPM2009-27,OME2009-22 |
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Committee | CPM |
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Conference Date | 2009/6/12(1days) |
Place (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Component Parts and Materials (CPM) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Constriction of Ferromagnetic Patterned Thin Film by Nano Scratching using AFM cantilever |
Sub Title (in English) | |
Keyword(1) | Atomic force microscope |
Keyword(2) | ferromagnetic thin film |
Keyword(3) | nanolithography |
Keyword(4) | nano-junction |
1st Author's Name | Hidenori SUGANUMA |
1st Author's Affiliation | Yokohama National University() |
2nd Author's Name | Kyungmin JANG |
2nd Author's Affiliation | Yokohama National University |
3rd Author's Name | Tsutomu YAMADA |
3rd Author's Affiliation | Yokohama National University |
4th Author's Name | Yasushi TAKEMURA |
4th Author's Affiliation | Yokohama National University |
Date | 2009-06-19 |
Paper # | EMD2009-15,CPM2009-27,OME2009-22 |
Volume (vol) | vol.109 |
Number (no) | 90 |
Page | pp.pp.- |
#Pages | 4 |
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