| Presentation | 2009-05-14 Deposition of Microcrystalline SiGe by Magnetron Sputtering on SiO_2 Substrates Akihiko HIROE, Tetsuya GOTO, Akinobu TERAMOTO, Tadahiro OHMI, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Microcrystalline Si_<1-x>Ge_x (x～0.8) has been successfully deposited over SiO_2 substrates by magnetron sputtering. Detailed investigation about the deposition condition revealed that crystalline phase begins to form at about 300℃, which roughly correspond to half the melting temperature of the material where surface migration of deposited atom starts to take place. Substrate bias effect was also investigated, which showed the degradation of crystallinity for the substrate temperature of 350℃ while improvement of crystallinity was found for 300℃ samples. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | magnetron sputter / microcrystalline SiGe / thin film transistor |
| Paper # | ED2009-25,CPM2009-15,SDM2009-15 |
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| Conference Information | |
| Committee | ED |
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| Conference Date | 2009/5/7(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
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| Vice Chair | |
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| Paper Information | |
| Registration To | Electron Devices (ED) |
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| Language | ENG |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Deposition of Microcrystalline SiGe by Magnetron Sputtering on SiO_2 Substrates |
| Sub Title (in English) | |
| Keyword(1) | magnetron sputter |
| Keyword(2) | microcrystalline SiGe |
| Keyword(3) | thin film transistor |
| 1st Author's Name | Akihiko HIROE |
| 1st Author's Affiliation | Ohmi Lab. New Industry Creation Hatchery Center (NICHe) Tohoku University() |
| 2nd Author's Name | Tetsuya GOTO |
| 2nd Author's Affiliation | Ohmi Lab. New Industry Creation Hatchery Center (NICHe) Tohoku University |
| 3rd Author's Name | Akinobu TERAMOTO |
| 3rd Author's Affiliation | Ohmi Lab. New Industry Creation Hatchery Center (NICHe) Tohoku University |
| 4th Author's Name | Tadahiro OHMI |
| 4th Author's Affiliation | Ohmi Lab. New Industry Creation Hatchery Center (NICHe) Tohoku University |
| Date | 2009-05-14 |
| Paper # | ED2009-25,CPM2009-15,SDM2009-15 |
| Volume (vol) | vol.109 |
| Number (no) | 23 |
| Page | pp.pp.- |
| #Pages | 6 |
| Date of Issue | |