Presentation | 2009-02-27 Double-dot single-electron transistor fabricated in silicon nanowire Mingyu JO, Takuya KAIZAWA, Masashi ARITA, Akira FUJIWARA, Yasuo TAKAHASHI, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | It is well known that a Si single-electron transistor (SET) is automatically fabricated by means of pattern-dependent oxidation when a one-dimensional Si wire formed on a silicon-on-insulator (SOI) substrate is oxidized. In this report, we demonstrate a simple fabrication method for the double-dot Si SETs when we use specially designed Si nanowires formed on SOI substrates. We confirmed the double-dot formation by comparing the measured electrical characteristics of the device with the results of simulation. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | single electron / Coulomb blockade / double dot |
Paper # | ED2008-233,SDM2008-225 |
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Committee | ED |
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Conference Date | 2009/2/19(1days) |
Place (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Electron Devices (ED) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Double-dot single-electron transistor fabricated in silicon nanowire |
Sub Title (in English) | |
Keyword(1) | single electron |
Keyword(2) | Coulomb blockade |
Keyword(3) | double dot |
1st Author's Name | Mingyu JO |
1st Author's Affiliation | Graduate School of Information Science and Technology, Hokkaido Univ.() |
2nd Author's Name | Takuya KAIZAWA |
2nd Author's Affiliation | Graduate School of Information Science and Technology, Hokkaido Univ. |
3rd Author's Name | Masashi ARITA |
3rd Author's Affiliation | Graduate School of Information Science and Technology, Hokkaido Univ. |
4th Author's Name | Akira FUJIWARA |
4th Author's Affiliation | NTT Basic Research Laboratories, NTT Corporation |
5th Author's Name | Yasuo TAKAHASHI |
5th Author's Affiliation | Graduate School of Information Science and Technology, Hokkaido Univ. |
Date | 2009-02-27 |
Paper # | ED2008-233,SDM2008-225 |
Volume (vol) | vol.108 |
Number (no) | 437 |
Page | pp.pp.- |
#Pages | 6 |
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