Presentation 2009-02-27
Double-dot single-electron transistor fabricated in silicon nanowire
Mingyu JO, Takuya KAIZAWA, Masashi ARITA, Akira FUJIWARA, Yasuo TAKAHASHI,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) It is well known that a Si single-electron transistor (SET) is automatically fabricated by means of pattern-dependent oxidation when a one-dimensional Si wire formed on a silicon-on-insulator (SOI) substrate is oxidized. In this report, we demonstrate a simple fabrication method for the double-dot Si SETs when we use specially designed Si nanowires formed on SOI substrates. We confirmed the double-dot formation by comparing the measured electrical characteristics of the device with the results of simulation.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) single electron / Coulomb blockade / double dot
Paper # ED2008-233,SDM2008-225
Date of Issue

Conference Information
Committee ED
Conference Date 2009/2/19(1days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair
Vice Chair
Secretary
Assistant

Paper Information
Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Double-dot single-electron transistor fabricated in silicon nanowire
Sub Title (in English)
Keyword(1) single electron
Keyword(2) Coulomb blockade
Keyword(3) double dot
1st Author's Name Mingyu JO
1st Author's Affiliation Graduate School of Information Science and Technology, Hokkaido Univ.()
2nd Author's Name Takuya KAIZAWA
2nd Author's Affiliation Graduate School of Information Science and Technology, Hokkaido Univ.
3rd Author's Name Masashi ARITA
3rd Author's Affiliation Graduate School of Information Science and Technology, Hokkaido Univ.
4th Author's Name Akira FUJIWARA
4th Author's Affiliation NTT Basic Research Laboratories, NTT Corporation
5th Author's Name Yasuo TAKAHASHI
5th Author's Affiliation Graduate School of Information Science and Technology, Hokkaido Univ.
Date 2009-02-27
Paper # ED2008-233,SDM2008-225
Volume (vol) vol.108
Number (no) 437
Page pp.pp.-
#Pages 6
Date of Issue