Presentation | 2009-02-26 Feild Emitter Array with focusing function and it's applications : Proposal of new application using FEA Yoichiro Neo, Masafumi Takeda, Tomoya Tagami, Syun Horie, Toru Aoki, Hidenori Mimura, Tomoya Yoshida, Masayoshi Nagao, Seigo Kanemaru, |
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Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We have developed field emission array (FEA) with new focusing electrode structure and proposed several devices and applications using FEA. In order to realize a fine defined field emission display (FED), optimized volcano-structured double-gated FEA was fabricated and focusing characteristics was successfully confirmed. By using volcano-structured double-gated FEA, high frequency vacuum tubes, X-ray imaging tube and excimer lamp were newly proposed and estimated. Further more, highly performed focusing characteristics is needed for the applications using crossover electron beam, such as electron beam microscope and electron beam lithography. The Quad-gated FEA, which equipped an einzel lens just in front of extractor electrode, was fabricated and estimated. It was shown by simulations that the emitted electron beam made a crossover. These results promised new devices and application using FEA. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | field emission arrays / field emission display / einzel lens / electron beam scanning microscope / electron beam lithography |
Paper # | ED2008-228,SDM2008-220 |
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Conference Information | |
Committee | ED |
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Conference Date | 2009/2/19(1days) |
Place (in Japanese) | (See Japanese page) |
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Topics (in Japanese) | (See Japanese page) |
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Paper Information | |
Registration To | Electron Devices (ED) |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Feild Emitter Array with focusing function and it's applications : Proposal of new application using FEA |
Sub Title (in English) | |
Keyword(1) | field emission arrays |
Keyword(2) | field emission display |
Keyword(3) | einzel lens |
Keyword(4) | electron beam scanning microscope |
Keyword(5) | electron beam lithography |
1st Author's Name | Yoichiro Neo |
1st Author's Affiliation | Research of institute electronics, Shizuoka University() |
2nd Author's Name | Masafumi Takeda |
2nd Author's Affiliation | Research of institute electronics, Shizuoka University |
3rd Author's Name | Tomoya Tagami |
3rd Author's Affiliation | Research of institute electronics, Shizuoka University |
4th Author's Name | Syun Horie |
4th Author's Affiliation | Research of institute electronics, Shizuoka University |
5th Author's Name | Toru Aoki |
5th Author's Affiliation | Research of institute electronics, Shizuoka University |
6th Author's Name | Hidenori Mimura |
6th Author's Affiliation | Research of institute electronics, Shizuoka University |
7th Author's Name | Tomoya Yoshida |
7th Author's Affiliation | National Institute of Advanced Industrial Science and Technology(AIST), Tsukuba central |
8th Author's Name | Masayoshi Nagao |
8th Author's Affiliation | National Institute of Advanced Industrial Science and Technology(AIST), Tsukuba central |
9th Author's Name | Seigo Kanemaru |
9th Author's Affiliation | National Institute of Advanced Industrial Science and Technology(AIST), Tsukuba central |
Date | 2009-02-26 |
Paper # | ED2008-228,SDM2008-220 |
Volume (vol) | vol.108 |
Number (no) | 437 |
Page | pp.pp.- |
#Pages | 5 |
Date of Issue |