Presentation 2009-02-26
Fabrication and application for Spin injection with Magnetite/InAs heterostructure
Takeshi Ejiri, J. Bubesh Babu, Kanji Yoh,
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Abstract(in English) The realization of high efficiency spin-injection is necessary for the performance of spin-transistor, although spin-transistor is included as key-device of spintronics that actively utilize electron spin for information processing. We target the establishing of the technology of spin-injection from magnetite, which is predicted high spin polarization as ideal half-metal, into semiconductor. First, when we measured the temperature dependence of Magnetite film, the change of resistance was observed at 120K. This is indicated Verwey transition of Magnetite. And we measured the magnetic property of Magnetite film with SQUID. As a result, Hysteresis loop was measured at 300K. Next, about fabrication of spin injection devices with Magnetite electrodes, we explain this process with epitaxial graphene layers on SiC and InAs/InAlAs HEMT sample inserted InAs channel.
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Keyword(in English) Spintronics / Spin injection / Spin transistor
Paper # ED2008-226,SDM2008-218
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Committee ED
Conference Date 2009/2/19(1days)
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Registration To Electron Devices (ED)
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication and application for Spin injection with Magnetite/InAs heterostructure
Sub Title (in English)
Keyword(1) Spintronics
Keyword(2) Spin injection
Keyword(3) Spin transistor
1st Author's Name Takeshi Ejiri
1st Author's Affiliation RCIQE, Hokkaido University()
2nd Author's Name J. Bubesh Babu
2nd Author's Affiliation RCIQE, Hokkaido University
3rd Author's Name Kanji Yoh
3rd Author's Affiliation RCIQE, Hokkaido University
Date 2009-02-26
Paper # ED2008-226,SDM2008-218
Volume (vol) vol.108
Number (no) 437
Page pp.pp.-
#Pages 5
Date of Issue