Presentation 2008-11-28
Analysis of AlGaN Growth on MOVPE by Computational Simulation
Akira HIRAKO, Masaya ICHIKAWA, Ken-ichi NAKAMURA, Kazuhiro OHKAWA,
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Abstract(in English) We have reported analysis of reaction pathways in metalorganic vapor-phase epitaxy (MOVPE) of GaN and AlN films by using computational fluid dynamics (CFD) simulations considering radiative heat transfer. AlGaN MOVPE growths are calculated at various reactor pressures, 10-100kPa, in this paper. In the case of 100kPa, it is found that parasitic reactions occur between TMGa, TMAl and NH_3. At low pressure of 10kPa, parasitic reactions suppress since the collision rate among the gaseous molecules are decreases in the lower pressure.
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Keyword(in English) AlGaN / MOVPE / Computational Fluid Dynamics
Paper # ED2008-170,CPM2008-119,LQE2008-114
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Committee LQE
Conference Date 2008/11/20(1days)
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Registration To Lasers and Quantum Electronics (LQE)
Language JPN
Title (in Japanese) (See Japanese page)
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Title (in English) Analysis of AlGaN Growth on MOVPE by Computational Simulation
Sub Title (in English)
Keyword(1) AlGaN
Keyword(2) MOVPE
Keyword(3) Computational Fluid Dynamics
1st Author's Name Akira HIRAKO
1st Author's Affiliation Dept. of Applied Physics, Tokyo University of Science()
2nd Author's Name Masaya ICHIKAWA
2nd Author's Affiliation Dept. of Applied Physics, Tokyo University of Science
3rd Author's Name Ken-ichi NAKAMURA
3rd Author's Affiliation Dept. of Applied Physics, Tokyo University of Science
4th Author's Name Kazuhiro OHKAWA
4th Author's Affiliation Dept. of Applied Physics, Tokyo University of Science
Date 2008-11-28
Paper # ED2008-170,CPM2008-119,LQE2008-114
Volume (vol) vol.108
Number (no) 323
Page pp.pp.-
#Pages 4
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